FerroelectricRTA Standard Operation Procedures

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Ferroelectric-RTA Standard Operation Procedures

• By David Wu

2
Check to see if the system is OK

• Check the gas valves.
• Check to see if the leak valve in the mechanical
  pump is closed. If no, close it. Check to see if
  the system is on operation condition (green
  label).
• Check the foregoing records in the working sheet.

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Turn on the system

• User utility permit personal password to turn
  on the power of monitor.
• Turn on the power of computer.
• Turn on the power of the RTA system.
• Turn on the power of mechanical pump.
• After that, the screen shows the window of main
  menu.
• Main menu
• The main menu offers 6 options
• 1.Edit recipes to create, modify, display or
  delete a recipe.
• 2.Run Process to run a process.
• 3.Maintenance for manual control of the system.
• 4.Historicals to display saved processed and
  alarm events.
• 5.Parameters to enter calibration tables,
  configuration parameters, etc.
• 6.Exit to return to Windows and to terminal
  control.

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Edit recipes

• When the EDIT mode is selected, the screen
  displays the recipe programming screen.
• Each recipe is made of
• A name (up to 10 characteristics),
• An associated calibration table to be chosen
  according to the sample to process,
• A comment,
• Thirty steps.

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• For each step the operator can select
• Temperature,
• Duration of step,
• Temperature control mode,
• To open or not the gas valve,
• To open or not the vacuum valve.
• Caution
• When using power mode there is no temperature
  control and you may damage your samples, or melt
  them in a few seconds if power is too high.
• The temperature range is 400 to 900 ?. The time
  range is 1 to 5 min. However, when the
  temperature is higher than 700 ?, the duration
  must be kept to lower than 3 min. The duration
  time at 900 ? is limited to lower then 1 min

6
Loading wafer

• Select maintenance in the main menu.
• Open purge valve.
• When the chamber pressure reach 1 atm, open the
  chamber door and load process wafer.
• Open vacuum valve to pump down chamber pressure
  until the pressure below 30 mbar.
• Caution
• Only ferroelectric materials, such as BST, PZT,
  SBT etc., are allowed.

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Run process

• Select Run process in the main menu.
• Download recipe.
• Start process.
• During process, the screen displays all the
  parameters
• Recipe name, current step, calibration table
  name, setpoint, temperature from pyrometer and
  thermalcouple, power to the lamps, and valve
  status.
• Whenever emergency occurs during operation,
  select End of process to shut down the process.

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End of process and unloading wafer

• After the process is completed, a window about
  cooling information appear automatically.
• After the window disappear, open the chamber door
  and unload the wafer.
• Clean the chamber by alcohol.
• Close the chamber door and pump down the chamber
  until the pressure below 30 mbar.

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Turn off the system

• Close all the valves including gas valve and
  vacuum valve.
• Select exit in the main menu.
• Turn off the computer.
• Turn off the system.
• Turn off the mechanical pump.
• User utility permit personal password to turn
  off the monitor power.