Characteristic of 850-nm InGaAs/AlGaAs Vertical-Cavity Surface-Emitting Lasers - PowerPoint PPT Presentation

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Characteristic of 850-nm InGaAs/AlGaAs Vertical-Cavity Surface-Emitting Lasers

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Characteristic of 850-nm InGaAs/AlGaAs Vertical-Cavity Surface-Emitting Lasers Master s thesis of Yuni Chang Speaker:Han-Yi Chu National Changhua University of ... – PowerPoint PPT presentation

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Title: Characteristic of 850-nm InGaAs/AlGaAs Vertical-Cavity Surface-Emitting Lasers


1
Characteristic of 850-nm InGaAs/AlGaAs
Vertical-Cavity Surface-Emitting Lasers
  • Masters thesis of Yuni Chang
  • SpeakerHan-Yi Chu
  • National Changhua University of Education

2
Introduction
  • Although the InGaAsP lasers operating at 1.3 and
    1.5 mm have long been used for long-haul optical
    fiber communication, laser diodes operating near
    850 and 650 nm find important applications in
    short-distance PMMA-based optical fiber
    communication.
  • The laser beam emitted from a vertical-cavity
    surface-emitting laser is circular in shape and
    hence can be easily coupled into an optical fiber
    with a coupling efficiency up to 90.
  • The vertical-cavity surface-emitting laser
    usually have small diverging angle, low threshold
    current, single laser mode output.

3
  • The vertical-cavity surface-emitting lasers
    operating in the spectral range near 850 nm
    usually utilize GaAs/AlGaAs as the active layer
    materials.
  • In a vertical-cavity surface-emitting laser, the
    distributed Bragg reflectors (DBR) are usually
    used as laser mirrors.
  • The laser cavity consists of the active region
    and two spacer regions (n spacer and p spacer ).
    In order to improve the carrier confinement and
    optical confinement, the bandgap energy of the
    spacers is usually higher than that of the
    active region.
  • In order to maximize the overlap of the electrons
    inside the active region and the standing wave, a
    laser cavity of one wavelength in length is
    usually utilized.

4
Simulation and Discussion
Al0.15Ga0.85As p-doping21018 (cm-3)

Al0.9Ga0.1As p-doping21018 (cm-3)
Al0.6Ga0.4As undoped
GaAs/Al0.35Ga0.65As or In0.1Ga0.9As/Al0.35Ga0.65As
3-Quantum wells undoped
Al0.6Ga0.4As undoped
Al0.9Ga0.1As n-doping11018 (cm-3)
Al0.15Ga0.85As n-doping11018 (cm-3)
5
  • The DBR mirrors consist of Al0.9Ga0.1As /
    Al0.15Ga0.85As that has an index of refraction
    and thickness of 2.97/71.55 and 3.5/60.7 nm
    respectively.
  • Since the use of indium in well of the
    In0.1Ga0.9As/Al0.35Ga0.65As active layer will
    result in a decrease of the bandgap energy, the
    width of the quantum well needs to be smaller
    than that of the GaAs/Al0.35Ga0.65As.
  • The widths of the quantum wells of
    GaAs/Al0.35Ga0.65As and In0.1Ga0.9As/Al0.35Ga0.65A
    s active layers are assumed to be 120Å and 40Å
    respectively.
  • In the In0.1Ga0.9As/Al0.35Ga0.65As active region,
    the well is under a compressive strain of 0.7.

6
Spectra of Spontaneous Emission Rate

In addition to the emission peak at 850 nm, there
exists emission peaks at shorter wavelength (at
815 nm for GaAs/Al0.35Ga0.65As and 807 nm for
In0.1Ga0.9As/Al0.35Ga0.65As) that are due to the
transitions from the second energy level in the
conduction band to the second energy level in the
valence band.
7
Energy band diagrams of the (a)
GaAs/Al0.35Ga0.65As and (b) In0.1Ga0.9As/Al0.35Ga0
.65As VCSEL under study.

8
Distribution of electron concentration near
active region at 330K and 2.0 mA.

9
Stimulated Recombination Rate

10
Laser output power as a function of input current
  • The In0.1Ga0.9As/Al0.35Ga0.65As and
    GaAs/Al0.35Ga0.65As quantum well structures have
    a threshold current of 0.37 mA and 0.77 mA.

11
Mode spectra of the GaAs/Al0.35Ga0.65As VCSEL at
0.56 mA (below the laser threshold) and 1.18 mA
(above the laser threshold)

12
Side Mode Suppression Ratio
  • The main mode to first side mode suppression
    ratio increases dramatically near the laser
    threshold.
  • In0.1Ga0.9As/Al0.35Ga0.65As VCSEL has a larger
    main mode to first side mode suppression ratio
    than the GaAs/Al0.35Ga0.65As VCSEL for all
    current input levels, which is beneficial for
    single laser mode operation.

13
Characteristic Temperature
  • These curves can be best-fitted with the
    following formula to corresponding characteristic
    temperature
  • A high characteristic temperature is desired for
    a VCSEL since the threshold current is less
    sensitive to temperature.

14
Threshold current of the InXGa1-XAs/Al0.35Ga0.65As
VCSEL as a function of temperature for different
indium composition,x.
  • From the results, the characteristic temperature
    increases when the indium composition in
    InXGa1-XAs/Al0.35Ga0.65As increases.

15
Conclusion
  • The strained InGaAs/AlGaAs VCSEL has a higher
    stimulated recombination rate, a lower threshold
    current , a higher main-side mode suppression
    ratio, and a higher characteristic temperature,
    which might be owing to its narrower well width
    and smaller carrier effective masses.
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