Facilities in the Molecular and Materials Physics group

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Facilities in the Molecular and Materials Physics
group

• Bill Gillin
• Dept of Physics

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Optical Spectroscopy

• Photoluminescence
• Tunable (215nm 2500nm) pulsed (6ns) excitation
• Can be used for time resolved measurements with
  detection in the range 300-1700nm
• Also photoluminescence excitation spectroscopy
• CW 405nm and 532nm pump lasers

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• Spectroscopic ellipsometery
• Horiba Jobin Yvon UVISEL NIR instrument on order
• 260-1700nm wavelength range
• Automatic variable angle goniometer 40-90
  (0.01 step)
• Microspot optics 0.05, 0.1 and 1mm spot size
• Heated sample stage RT-600C
• Liquid sample cell

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• Time of flight
• Facilities for photoconductivity measurements to
  measure carrier mobilities in organics
• Tuneable excitation using OPO
• Ultrafast measurements using 355nm or 266nm

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Electrical Characterisation

• A range of source measure units with current
  measurement down to femtoamps
• These can be used for transistor characterisation

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Photolithography

• Spin coater
• Karl Suss MJB3 Mask Aligner
• Bakeout oven
• Also have UV light box for crude photolithography

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Deposition systems

• Two dedicated organic evaporation systems
• 6 organic sources 2 metal sources
• 4 organic sources 2 metal sources
• Both systems have shadow mask facilities
• Also one general purpose evaporator mainly used
  for metal evaporation

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Other equipment

• Dektak 3ST surface profiler
• Oxygen plasma system