Development of Tribological Coatings for Cryocoolers Task III. 4 Hydrogen Storage for Spaceport and Vehicle Applications

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Development of Tribological Coatings for
Cryocoolers Task III. 4 Hydrogen Storage for
Spaceport and Vehicle Applications
Neelkanth G. Dhere and Anil Pai
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Titanium Nitride (TiN) Coatings

• Additional TiN samples prepared by DC magnetron
  sputtering on glass have been provided to Dr. Raj
  Vaidyanathan and his colleagues for microhardness
  measurements.
• However, there is a delay since the graduate
  student responsible for these measurements is not
  available.

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Titanium Nitride (TiN) Coatings

• Additional TiN samples by DC magnetron sputtering
  on aluminum substrates have been prepared using
  optimized film parameters and have been sent for
  characterization of the samples for
  microhardness, wear and coefficient of friction
  analysis at University of Florida (UF),
  Gainesville.
• These tests are being carried out with the
  assistance of Dr. Gregory Sawyer at UF and the
  results are awaited.

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Titanium Nitride (TiN) Coatings

• Presently the parameters are being optimized for
  deposition of bilayer coatings of TiN and MoS2 on
  1 cm x 1 cm silicon wafer.
• Leaks were observed in the present chamber and
  adequate vacuum was not being obtained to carry
  out the depositions. Leaks could not be
  eliminated completely and therefore, the setup
  was changed to carry out deposition in another
  chamber. The chamber is now ready for carrying
  out depositions.
• Deposition of the film on silicon wafer will be
  carried out and afterwards, the coefficient of
  friction and wear measurements will be carried
  out with the assistance of Dr. Quanfen Chen and
  his colleagues at UCF.

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MWCVD System

• Microwave plasma applicator ordered earlier will
  be available next week.
• After receiving the plasma applicator the
  Microwave assisted plasma chemical vapor
  deposition system (MWCVD) will be constructed.
• After the installation of MWCVD system, DLC
  coatings will be prepared and characterized.

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Tasks to be Accomplished

• Characterization of bilayer coatings of TiN and
  MoS2 on a silicon wafer is being carried out.
• Results of characterization of coatings of TiN on
  aluminum substrates for microhardness, wear and
  coefficient of friction analysis at UF is being
  awaited.
• Coefficient of friction and wear measurements at
  UCF on Si wafer will also be carried out with the
  assistance of Dr. Chen and his colleagues.
• After the installation of MWCVD system, DLC
  coatings will be deposited and characterized.