332:578 Deep Submicron VLSI Design Lecture 22 Power Distribution and PhaseLocked Loop Clocking - PowerPoint PPT Presentation

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332:578 Deep Submicron VLSI Design Lecture 22 Power Distribution and PhaseLocked Loop Clocking

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Title: 332:578 Deep Submicron VLSI Design Lecture 22 Power Distribution and PhaseLocked Loop Clocking


1
332578 Deep SubmicronVLSI Design Lecture
22Power Distribution andPhase-Locked Loop
Clocking
  • Mike Bushnell
  • Rutgers University
  • Spring 2005

2
Outline
  • Power Distribution
  • On-Chip Network
  • IR Drops
  • Power Supply Droop
  • L di/dt
  • Bypass Capacitance
  • Power Network Modeling
  • Return Loops
  • Substrate Noise
  • Phase-Locked Loop Clocking
  • Summary

Material from CMOS VLSI Design,by Weste and
Harris, Addison-Wesley, 2005
3
Power Distribution
  • Consists of metal wires on the chip, package, and
    board bypass Cs to supply instantaneous
    current
  • Properties
  • Maintains stable VDD with little noise
  • Supplies average and peak power needs
  • Provides signal current return paths
  • Avoids wearout electromigration and
    self-heating
  • Consumes little chip area wiring
  • Easy to lay out
  • Typical noise goal /- 5 or 10

4
Sun mprocessor Power
5
On-Chip Network
  • Standard cell strapping

6
Alternate Strapping
7
Large, High-Power Layouts
  • Problems
  • Resistance of power in thin lower-level metal
  • Causes too much IR drop
  • Current must be carried on wide, thick
    upper-metal grid
  • Grids on middle/lower layers bring current down
    to cells
  • Provide ample vias to carry high currents
  • When pad ring used, biggest IR drop near chip
    center
  • Better solution use C4 solder bumps throughout
    area of chip rely on low-R power plane in
    package

8
6-Layer Metal Power Dist.
9
X-X Cross Section
10
Y-Y Cross Section
11
IR Drops
  • Power supply network R includes
  • R of on-chip wires/vias
  • R of bond wires/solder bumps to package
  • R of package planes (traces)
  • R of printed circuit board (PCB) places
  • Package/PCB -- much thicker wider Cu than chip
  • ? Chip R dominates IR drop
  • IR drop from both average instantaneous power
  • Instantaneous (larger) spikes near clock edge
  • Use bypass C to supply instantaneous power
  • Network needs low R to supply average power

12
Power Supply Droop
13
L di/dt Noise
  • Power supply inductance dominated by
  • L of bond wires (1 nH/mm)
  • L of controlled collapse chip connection (C4)
    bumps (100 pH)
  • L of multiple Ls in parallel is reduced
  • ? 50 of package pins are power/ground
  • Biggest current transients
  • Switching I/O signals
  • Changes between idle and active chip core mode
  • Cannot transition between min and max power in 1
    clock period
  • Pipeline now must enter/exit idle mode 1 stage at
    a time

14
On-Chip Bypass Capacitance
  • Bypass or decoupling C
  • Handles instantaneous chip current demands
  • Must be distributed across chip
  • Local spike supplied by local bypass C, not by R
    of overall power grid
  • Greatly reduces di/dt drawn from package
  • Provided by gate C of quiescent transistors
  • Called symbiotic bypass C

15
Symbiotic Bypass C
  • Cgs3 Cgs4
  • Usually, ½ of gate C of transistor is symbiotic
  • Usually small of gates switching at any time
  • ? Nearly ½ of entire chip gate C is symbiotic

16
Symbiotic C
  • Adequate for low- or medium-power chips
  • Inadequate for high-power chips
  • Must provide explicit symbiotic C
  • Make with nMOSFET with gate at VDD, drain
    source at VSS

17
Decoupling C Layout
  • Maximize C / area
  • Make transistor as long as possible
  • Most of area is gate oxide, not contacts
  • If too long, transistor R causes too slow a
    response
  • Use L 4 to 12 X minimum
  • Waffle layout openings in poly let diffusion be
    grounded, use VDD contacts to connect POLY to
    METAL to bump pads
  • May leak too much with thinner oxide and
    tunneling
  • Will then require specialized oxide layer for
    bypass Cs

18
Waffle Bypass C
19
May Violate Antenna Rules
  • Use circuit to fix this

20
Power Network Modeling
21
Real Cs
  • Has series R and series L and self-resonant f
  • Larger Cs have higher series Ls
  • Leads to lower self-resonant fs, beyond which
    they are useless
  • Use many Cs of different sizes
  • Give low Z over all fs of interest

22
Impedance of Bypass C
  • 1 mF C with 0.25 nH L and 0.03 W R

23
Effectiveness of Cs
  • Bulk ceramic Cs effective over 1-10 MHz
  • Package Cs effective over 10-200 MHz
  • Above 200 MHz, L of solder bumps or bond wires
  • Makes all but on-chip decoupling Cs ineffective
  • Bypass Cs resonate with series L of package
    solder bumps
  • Makes low L across all frequencies hard to
    achieve
  • Some packages high Z in 10-100 MHz caused by
    resonances
  • Below clock f of many chips
  • Power supply noise is severe if chip alternates
    between high- and low-power operation at resonant
    f

24
Supply Z vs. Frequency
  • With multiple resonances

25
Need for Bypass Cs
  • Sudden current spike in chip
  • Delay until spike reaches power supply
  • Supply adjusts current it delivers
  • Current returns to chip
  • Lower delay bound is speed of light
  • When gate switches
  • Regulator does not know about it until after
    transition
  • Current to charge load must come by nearby bypass
    C
  • Causes supply drop later recharged by voltage
    regulator, which recharges bypass Cs

26
Distributed Power Model
  • Needed to model supply voltage variation across
    chip

27
Full-Chip Power Grid
  • Simulation takes many days to run
  • Current signatures of synthesized logic, SRAM,
    repeater banks, and domino logic differ
  • Shows map of voltage vs. time for current pattern
  • Itanium 2 IR droop greatest in integer execution
    unit
  • Several power-hungry domino adders contributed

28
Itanium 2 VDD Droop
29
Signal Return Paths
  • Current flows in loops
  • Signal sent down wire
  • Current must return to driver through VDD/VSS
    wires
  • Power supply network is signal return path
  • Impedance between VDD and VSS is low at high f
  • Due to decoupling Cs
  • High f AC current flows readily between VDD VSS
  • Both can be signal return paths for both 0 and
    1

30
Signal Return Paths
  • L of wire a current loop area
  • Large L increases delay or causes noise
  • ? Good power network must provide return paths
    near all signal paths
  • Keep current loop area small
  • Signals with overlapping loop areas have mutual L

31
Long Signal Return Paths
  • Causes pathological behavior

32
Solution
  • Wire speed of light set by
  • Power grid should occupy 2 or more orthogonal
    metal layers
  • Do not use fingers on 1 metal layer
  • Put 1 VDD or GND line for each N signal lines on
    each metal layer
  • Use signal-to-return (SR) ratio of N 10 on at
    least 2 orthogonal upper metal layers
  • Ensures that no path has long return paths
  • Use SR of 21 at high f
  • Every signal has VDD or GND as a neighbor
  • Reduces capacitive crosstalk 2 X

33
Power Supply Filtering
  • Circuits particularly sensitive to power noise
  • Phase-locked loop (PLL)
  • Clock buffers causes clock jitter
  • Analog circuits
  • Pentium 4 power supply filter
  • On clock buffers to reduce jitter
  • Attenuates supply noise from 10 to 2 of VDD
  • Uses pMOSFET as R
  • RC time constant of 2.5ns
  • IR drop of 70 mV

34
Power Supply Filtering
  • Eliminates high-f noise on power supply

35
Substrate Noise
  • Current flow in substrate causes noise on
    transistor body terminal
  • C Coupling through reverse-biased source/drain to
    substrate diodes
  • Impact ionization as I flows through ON
    transistor
  • Substrate noise modulates Vt by body effect
  • Mixed-signal designs
  • Large of rapidly-switching digital gates inject
    noise on digital VSS that enters analog circuit
    via common substrate

36
Substrate Noise Fixes
  • Use plenty of substrate/well contacts, spaced
    throughout substrate/well area
  • Separate analog circuits from digital
  • Surround analog circuits with guard rings
  • Some processes have much less substrate coupling
    since transistors are isolated in their own wells
  • Twin-tub
  • Triple-well
  • Silicon-on-Insulator (SOI)

37
Types of Clocking Systems
  • Single Phase
  • Double Phase

38
Clock Design Guidelines
  • Period when charge stays on storage C governed
    by source/drain leakage, depends on T
  • Always refresh or clamp dynamic modes when in
    standby or low-power mode
  • Use phased-locked loop
  • To synchronize internal external clocks (in
    phase)
  • To operate internal clock faster than external
    clock (clock doubling, tripling, or quadrupling)

39
Ordinary Clock
40
Phase-Locked Loop Clocks
41
Clock Multiplying PLL
42
PLL Synchronizer
43
Summary
  • Power Distribution
  • On-Chip Network
  • IR Drops
  • Power Supply Droop
  • L di/dt
  • Bypass Capacitance
  • Power Network Modeling
  • Return Loops
  • Substrate Noise
  • Phase-Locked Loop Clocking
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