Artifacts in ballistic Magnetoresistance measurements J' APPL' Phys' Vol'95' 2004 Lubna Rafiq Shah D - PowerPoint PPT Presentation

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Artifacts in ballistic Magnetoresistance measurements J' APPL' Phys' Vol'95' 2004 Lubna Rafiq Shah D

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1- BMR over 3000% in Ni nanocontact at room temperature (PRB 66, 2002) 2- 100,000 % BMR in stable Ni nanocontacts at room temperature (PRB, 67,2003) ... – PowerPoint PPT presentation

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Title: Artifacts in ballistic Magnetoresistance measurements J' APPL' Phys' Vol'95' 2004 Lubna Rafiq Shah D


1
Artifacts in ballistic Magnetoresistance
measurements( J. APPL. Phys. Vol.95. 2004
)Lubna Rafiq ShahDepartment Of
PhysicsUniversity Of Delaware
2
  • OUTLINE
  • 1- What is Ballistic Magnetoresistance (BMR)
  • 2- Study of factors that can mask real BMR effect
  • 3- Designing Artifact-free experiments
  • 4- Summary

3
  • 1- Ballistic Magnetoresistance
  • In the high resistance state a domain wall is
    presumed to lie in a nanocontact. If the spatial
    extent of the domain wall lt spin-flip mean
    free-path of electrons
  • ? The electrons trying to cross the wall would
    have a high reflection probability due to poor
    matching of the Fermi surfaces of spin-up and
    spin-down electrons.
  • ? Reflection would manifest as higher electrical
    resistance than when both sides of the
    nanocontact were magnetized in parallel.

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  • Experimental results reported on BMR
  • 1- BMR over 3000 in Ni nanocontact at room
    temperature (PRB 66, 2002)
  • 2- 100,000 BMR in stable Ni nanocontacts at
    room temperature (PRB, 67,2003)
  • 3- BMR effects exceeding 500 are found at room
    temperature in a field of 7 mT in nanocontacts
    between Fe3O4 crystallites. (PRL, 87, 2001)
  • 4- Ballistic magnetoresistance in a magnetic
    nanometer sized contact An effective gate for
    spintronics. The contacts exhibit
    magnetoresistance of up to 700 at room
    temperature and low applied fields .(APL,
    80,2002)

8
  • WAIT..
  • ARE these results real
  • ????

9
  • 2- Possible factors for masking real BMR
  • Lengthening due to magnetostatic effect.
  • Stretching or contracting due to
    Magnetostriction.
  • Applied field gradient-Magnetomechanical effect.
  • Bowing-out effect due to magnetostriction.

10
  • Magnetostatic effect
  • Consideration of field energy in the gap between
    the ends
  • Magnetostatic attractive force between the ends
    of the magnetized wire
  • Produces lengthening ?l in the wire of length l
    and Y is the modulus of elasticity

11
  • For flat ends, ?l3nm
  • For hemispherical ends, ?l1nm
  • For anti-parallel magnetized wires, equal
    contraction occurs due to repulsive magnetostatic
    force.
  • Between parallel and anti parallel states, change
    in separation between the ends of the wire 4-12
    nm.
  • Physical dimensions of BMR1-10nm ? profound
    effect on the structure (resistivity) due to
    displacement 4-12nm

12
  • Magnetostriction effect
  • Magnetostriction is the changing of a material's
    physical dimensions in response to changing its
    magnetization. In other words, a magnetostrictive
    material will change shape when it is subjected
    to a magnetic field.

13
In the absence of field, Ni wire ?
multidomain In the presence of axial applied
field ? magnetize axial wire? magnetostriction
makes axial wire shorter ? pull on nanocontact?
data having low R at low field and a constant
higher R at high field.
14
  • Field gradient-magnetostatic force
  • Transverse wire can be mounted in such a way
    that it experiences field gradient of the magnet.
  • Magnetostatic force would tend to break the
    nanocontact.

15
  • Field increases? transverse wire experiences
    attraction toward the pole.
  • At higher field, contact is re-established due to
    magnetostatic attraction between wires.

16
  • Bowing out effect
  • Magnetostriction effect? shorting of axial wire
    and lengthening of transverse.
  • If the transverse wire is straight and epoxy is
    rigid
  • Bowing out is required to accommodate the
    increase in length.
  • Distort the nanocontact.
  • Bowing out effect can occur in any direction,
    increasing or decreasing the resistance of
    nanocontact.

17
  • 3- Designing Artifact-free experiments
  • To suppress physical displacement due to above
    mentioned effects,
  • Nanocontact electrodeposited between
    ferromagnetic films
  • Nanocontacts formed by ion-beam etching
  • Nanocontacts between ferromagnetic films
    connected by a pinhole through an insulating film
  • Ferromagnetic nanocontacts electrodeposited on Cu
    films anchored on wafers.

18
  • None of these samples gave credible evidence for
    a BMR

19
  • 5- Summary
  • Previous attempts to observer BMRserious
    Artifact.
  • Carefully designed experiments? no evidence for
    real BMR.
  • Entirely possible that there is no real BMR in
    previously published data.
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