Use of Oxide and Nitride Films in IC Fabrication

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Use of Oxide and Nitride Films in IC Fabrication
Gate dielectrics Field oxide Masks Wire
insulation Device encapsulation
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Diffusion in SiO2
Recessed Oxidation for MOSFET
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Oxidation Rate Constants
x2 Ax Bt
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Oxidation Rate Parameters
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Oxide Thickness
Wet Oxidation Dry Oxidation
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Nitridation Growth Rate
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Anodic Oxidation
Plasma Oxidation