Strength Design Maps for Nanoscale Metallic Multilayer Thin Films Peter M. Anderson, Ohio State Univ

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Strength Design Maps for Nanoscale Metallic
Multilayer Thin FilmsPeter M. Anderson, Ohio
State University, MET DMR-0508987

• Background Nanoscale thin films
• Motivation
• control of chemistry, structure (Fig. 1)
• extraordinary strength (Fig. 2)
• Needed design strategyto optimize yield
  strength
• Strength applications
• MEMS, hard coatings
• refractive optical elements
• strained layer semiconductors
• magneto-elastic films.

Fig 1. 120nm ?-Ni(Al)/120nm ?-Ni3Al multilayer
Banerjee et al, 2001.
Fig 2. RT hardness vs bi-layer period, adapted
from Clemens et al, 1999.
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Strength Design Maps for Nanoscale Metallic
Multilayer Thin FilmsPeter M. Anderson, Ohio
State University, MET DMR-0508987

• Research Elements

Strength design maps
Plan-view transmission Electron microscopy
(courtesy D Mitlin)
Internal stress and dislocation content (w/A
Misra)
Micropillar compression testing (w/M Uchic)
Interfacial barrier strength to slip Transmission
(w/R Hoagland)
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Strength Design Maps for Nanoscale Metallic
Multilayer Thin FilmsPeter M. Anderson, Ohio
State University, MET DMR-0508987

• Outcomes
• Technical
• Develop and validate yield strength design maps
  for A/B metallic multilayer thin films.
• Non-technical
• Web-based tool to produce maps for systems of
  interest to users,
• Graduate research education for two students in
  computational and experimental aspects of thin
  film processing, characterization, and
  computational mechanics modeling,
• Web-based learning module integrating mechanics
  and materials principles to optimize strength in
  A/B metallic multilayers.