D.-A. Luh, A. Brachmann, J. E. Clendenin, T. Desikan, E. L. Garwin, - PowerPoint PPT Presentation

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D.-A. Luh, A. Brachmann, J. E. Clendenin, T. Desikan, E. L. Garwin,

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Recent Polarized Photocathode R&D at SLAC D.-A. Luh, A. Brachmann, J. E. Clendenin, T. Desikan, E. L. Garwin, S. Harvey, R. E. Kirby, T. Maruyama, and C. Y. Prescott – PowerPoint PPT presentation

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Title: D.-A. Luh, A. Brachmann, J. E. Clendenin, T. Desikan, E. L. Garwin,


1
Recent Polarized Photocathode RD at SLAC
D.-A. Luh, A. Brachmann, J. E. Clendenin, T.
Desikan, E. L. Garwin, S. Harvey, R. E. Kirby, T.
Maruyama, and C. Y. Prescott Stanford Linear
Accelerator Center, Stanford, CA 94025 R.
Prepost Department of Physics, University of
Wisconsin, Madison, WI 53706
2
Highlights
  • Current cathode in use (high-gradient-doped
    strained GaAsP)
  • Growth and preparation techniques for
    photocathodes and their weakness
  • Possible solutions/improvements and current
    progress

3
High-Gradient-Doped Strained GaAsP
  • Currently used in the accelerator
  • Peak polarization 82 _at_805nm
  • QE 0.4 _at_ 805nm
  • No charge limit effect with available laser
    energy

4
High-Gradient-Doped Strained GaAsP
  • Cathode Growth
  • Grown by Bandwidth Semiconductor
  • Metal-Organic-Chemical-Vapor-Deposition (MOCVD)
  • Zn-doping
  • Cathode preparation
  • Anodized at 2.5V to form a 3 nm oxide layer
  • Waxed to a glass for cutting
  • Degreased in boiling Trichloroethane.
  • Stripped surface oxide layer by NH4OH
  • Transferred into loadlock immediately.
  • Heat-cleaned at 600C for one hour
  • Activated by Cs/NF3 co-deposition
  • Heat-cleaned and activated twice

5
Weakness of Current Cathode Growth and
Preparation Techniques
  • MOCVD
  • The base pressure of MOCVD growth chamber is in
    high-vacuum range, compared with ultra
    high-vacuum in other techniques.
  • MOCVD requires higher growth temperature.
  • MOCVD growth mechanism is complicated.
  • Zn-doping
  • The diffusion coefficient of Zn in GaAs is high
    at the heat-cleaning temperature we use.
  • The heat-cleaning capability of Zn-doped cathodes
    is limited.
  • Single strained layer
  • Strain relaxation in thick strained layers causes
    lower polarization.

6
Dopant Loss during Heat-Cleaning
  • High-gradient-doped cathode shows charge limit
    effect after three activations at 600?C.

7
SIMS Analysis
  • SIMS (Secondary Ion Mass Spectroscopy) analysis
    confirms Zn dopant loss after repeated
    heat-cleaning at 600C.

8
Strain Relaxation in Thick Strained Layers
  • Strained layers start relaxing beyond critical
    thickness (10nm).
  • Strained layers relax partially until reaching
    practical limit (100nm).
  • Strain relaxation ? Lower polarization

Active Layer Thickness (nm) Polarization ()
MO5-5868 90 82
MO5-6007 170 70
9
Possible Improvements on Cathode Growth and
Preparation
  • MBE (Molecular Beam Epitaxy) growth High
    quality films
  • Ultra-high-vacuum environment
  • Lower growth temperature and simpler growth
    mechanism
  • More choices on dopants
  • Be/C doping better heat-cleaning capability
  • Lower impurity diffusion coefficients in GaAs at
    high temperature
  • As-capped cathodes -- Lower heat-cleaning
    temperature
  • Atomic-hydrogen cleaning Lower heat-cleaning
    temperature
  • Superlattice structure Preserve strain in
    active layers ? higher polarization

10
MBE vs. MOCVD
  • Both SVT-3982 and MO5-5868 are high-gradient-doped
    strained GaAsP.
  • SVT-3982 is MBE-grown Be-doped (SVT Associates).
  • MO5-5868 is MOCVD-grown Zn-doped (Bandwidth
    Semiconductor).
  • Preliminary result shows that MBE-grown cathode
    has better performance.
  • Heat-cleaning capability of Be-doped cathodes
    need to be determined.

11
Atomic-Hydrogen Cleaning
  • The goal to achieve good QE with lower
    heat-cleaning temperature
  • Thanks to Matt Poelker of Jefferson Lab for many
    discussions and helps.
  • Cathodes are atomic-hydrogen cleaned, and then
    transferred into activation chamber through
    loadlock.

12
Preliminary Results from Atomic-Hydrogen Cleaning
System
  • GaAs Reference Cathode stripped its surface
    oxide by NH4OH, heat-cleaned, and activated
  • GaAs Test Cathode No NH4OH stripping. Cleaning
    procedures are indicated in the figure.
  • Atomic-hydrogen cleaning shows promising results.
    Cleaning condition needs to be optimized.

13
Superlattice Photocathodes
  • Critical thickness (10nm) limits the size of
    strained active region.
  • Multiple quantum wells to preserve strain
  • Strained layers sandwiched between unstrained
    layers
  • The thickness of single strained layer is less
    than critical thickness.
  • Band structure calculation to determine cathode
    structure parameters (well width, barrier width,
    and phosphorus fraction, etc.)
  • X-ray diffraction to characterize cathode
    structure (layer thickness, composition, and
    strain, etc.)
  • Photoluminescence to check cathode band structure

14
Superlattice Band Structure Calculations
  • kp transfer matrix method (S. L. Chuang, Phys.
    Rev. B 43 9649 (1991))
  • Dm transmission and reflection at interfaces,
  • Pm propagation and decay in layers
  • Set AN2 1, BN2 0 Change incident electron
    energy, and look at 1/A1 for transmittivity.
  • Transmittivity maximum ? Resonant tunneling ?
    Energy level

15
Multiple Quantum Well Simulation
16
Multiple Quantum Well Simulation
widthBarrier 50nm
  • QE Band Gap
  • Polarization HH-LH Splitting

Effective Band Gap
HH-LH Splitting
17
X-Ray Diffraction -- Theory
  • Braggs Law n ? 2 d sin?
  • All lattice planes contribute to Bragg
    diffraction
  • Every layer contributes a Bragg peak
  • Repeating series of thin layers causes additional
    peaks

18
X-Ray Diffraction Rocking Curves
  • Test cathode strained GaAs
  • (004) scan distance between layers

GaAs Bulk
Graded GaAs1-xPx
GaAs0.64P0.36
Strained GaAs
19
Strained Superlattice GaAsP SVT-3682 and SVT-3984
T. Nishitani et al, SPIN2000 Proceedings p.1021
20
Strained superlattice GaAsP SVT-3682 and SVT-3984
CB1
1.65 eV
HH1
0.86 eV
LH1
GaAsP
GaAs
GaAsP
GaAs
GaAsP
  • Photoluminescence confirms the simulation
    prediction

21
Rocking Curve (004) scan from SVT-3682
  • Both SVT-3682 and SVT-3984 are superlattice
    cathodes
  • MBE grown Be-doped (SVT Associates).
  • Barrier width 30Å
  • Well width 30Å
  • Phosphorus fraction in GaAsP 0.36
  • Layer number 16
  • Highly-doped surface layer thickness 50Å
  • XRD analysis on SVT-3682
  • Well Width Barrier Width 32Å
  • Phosphorus fraction in GaAsP 0.36

22
Superlattice Cathode Performance
  • Peak polarization gt 85
  • Good QE
  • SVT-3984 was tested in Gun Test Lab at SLAC, and
    there was no charge limit effect with available
    laser energy.

23
Conclusion
  • MBE-grown Be-doped cathodes show equal or better
    performance than MOCVD-grown Zn-doped cathodes.
  • Preliminary test of atomic-hydrogen cleaning
    shows promising result.
  • First strained superlattice cathodes show very
    good performance.

To do
  • Study the heat-cleaning capability of Be-doped
    and C-doped cathodes.
  • Optimize the process of atomic-hydrogen cleaning.
  • Study As-capped cathodes.
  • Test superlattice cathodes with different
    structure parameters
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