Introduction to CMOS VLSI Design Lecture 1: Introduction, Circuits and layout

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Introduction toCMOS VLSIDesignLecture 1
Introduction, Circuits and layout
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Introduction

• Integrated circuits many transistors on one
  chip.
• Very Large Scale Integration (VLSI) millions of
  logic gates many Mbits of memroy
• Complementary Metal Oxide Semiconductor
• Fast, cheap, low power transistors
• Today How to build your own simple CMOS chip
• CMOS transistors
• Building logic gates from transistors
• Transistor layout
• Rest of the course How to build a good CMOS chip

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A Brief History

• 1958 First integrated circuit
• Built by Jack Kilby at Texas Instruments with 2
  transistors
• 2003
• Intel Pentium 4 mprocessor (55 million
  transistors)
• 512 Mbit DRAM (gt 0.5 billion transistors)
• 53 compound annual growth rate over 45 years
• No other technology has grown so fast so long
• Driven by miniaturization of transistors
• Smaller is cheaper, faster, lower in power!
• Revolutionary effects on society

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Annual Sales

• 1018 transistors manufactured in 2003
• 100 million for every human on the planet
• 100B business in 2004

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Invention of the Transistor

• Vacuum tubes ruled in first half of 20th century
  Large, expensive, power-hungry, unreliable
• 1947 first point contact transistor
• John Bardeen and Walter Brattain at Bell Labs

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Transistor Types

• Bipolar transistors
• npn or pnp silicon structure
• Small current into very thin base layer controls
  large currents between emitter and collector
• Base currents limit integration density (power
  dissipation issue)
• Metal Oxide Semiconductor Field Effect
  Transistors
• nMOS and pMOS MOSFETS
• Voltage applied to insulated gate controls
  current between source and drain
• Low power allows very high integration (ideally
  zero static power)

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MOS Integrated Circuits

• 1970s processes usually had only nMOS
  transistors
• Inexpensive, but consume power while idle
• 1980s-present CMOS processes for low idle power

Intel 1101 256-bit SRAM
Intel 4004 4-bit mProc
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Moores Law

• 1965 Gordon Moore plotted transistor on each
  chip
• Fit straight line on semilog scale
• Transistor counts have doubled every 18 months

Integration Levels SSI 10 gates MSI 1000
gates LSI 10,000 gates VLSI gt 10k gates
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Corollaries

• Many other factors grow exponentially
• Ex clock frequency, processor performance

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Silicon Lattice

• Transistors are built on a silicon substrate
• Silicon is a Group IV material
• Forms crystal lattice with bonds to four neighbors

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Dopants

• Silicon is a semiconductor
• Pure silicon has no free carriers and conducts
  poorly
• Adding dopants increases the conductivity
• Group V (Arsenic) extra electron (n-type)
• Group III (Boron) missing electron, called hole
  (p-type)

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p-n Junctions

• A junction between p-type and n-type
  semiconductor forms a diode.
• Current flows only in one direction

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nMOS Transistor

• Four terminals gate, source, drain, body
• Gate oxide body stack looks like a capacitor
• Gate and body are conductors
• SiO2 (oxide) is a very good insulator
• Called metal oxide semiconductor (MOS)
  capacitor

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nMOS Operation

• Body is commonly tied to ground (0 V)
• When the gate is at a low voltage
• P-type body is at low voltage
• Source-body and drain-body diodes are OFF
• No current flows, transistor is OFF

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nMOS Operation Cont.

• When the gate is at a high voltage
• Positive charge on gate of MOS capacitor
• Negative charge attracted to body
• Inverts a channel under gate to n-type
• Now current can flow through n-type silicon from
  source through channel to drain, transistor is ON

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pMOS Transistor

• Similar, but doping and voltages reversed
• Body tied to high voltage (VDD)
• Gate low transistor ON
• Gate high transistor OFF
• Bubble indicates inverted behavior

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Power Supply Voltage

• GND 0 V
• In 1980s, VDD 5V
• VDD has decreased in modern processes due to
  scaling
• High VDD would damage modern tiny transistors
• Lower VDD saves power (Dynamic power is
  propotional to C.VDD2.f.a)
• VDD 3.3, 2.5, 1.8, 1.5, 1.2, 1.0,

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Transistors as Switches

• We can view MOS transistors as electrically
  controlled switches
• Voltage at gate controls path from source to drain

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CMOS Inverter
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CMOS Inverter
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CMOS Inverter
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CMOS NAND Gate
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CMOS NAND Gate
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CMOS NAND Gate
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CMOS NAND Gate
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CMOS NAND Gate
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CMOS NOR Gate
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3-input NAND Gate

• Y pulls low if ALL inputs are 1
• Y pulls high if ANY input is 0

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3-input NAND Gate

• Y pulls low if ALL inputs are 1
• Y pulls high if ANY input is 0

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Complementary CMOS

• Complementary CMOS logic gates
• nMOS pull-down network
• pMOS pull-up network
• a.k.a. static CMOS

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Series and Parallel

• nMOS 1 ON
• pMOS 0 ON
• Series both must be ON
• Parallel either can be ON

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Conduction Complement

• Complementary CMOS gates always produce 0 or 1
• Ex NAND gate
• Series nMOS Y0 when both inputs are 1
• Thus Y1 when either input is 0
• Requires parallel pMOS
• Rule of Conduction Complements
• Pull-up network is complement of pull-down
• Parallel -gt series, series -gt parallel

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Compound Gates

• Compound gates can do any inverting function
• Ex

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Example O3AI

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Example O3AI

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Inverter Cross-section

• Typically use p-type substrate for nMOS
  transistors
• Requires n-well for body of pMOS transistors
• Substrate must be tied to GND and n-well to VDD
• Metal to lightly-doped semiconductor forms poor
  connection
• Use heavily doped well and substrate contacts /
  taps

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Layout

• Chips are specified with set of masks
• Minimum dimensions of masks determine transistor
  size (and hence speed, cost, and power)
• Feature size f distance between source and
  drain
• Set by minimum width of polysilicon
• Feature size improves 30 every 3 years or so
• Normalize for feature size when describing design
  rules
• Express rules in terms of l f/2
• E.g. l 0.3 mm in 0.6 mm process

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Simplified Design Rules

• Conservative rules to get you started

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Inverter Layout

• Transistor dimensions specified as Width / Length
• Minimum size is 4l / 2l, sometimes called 1 unit
• In f 0.6 mm process, this is 1.2 mm wide, 0.6
  mm long

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Example Inverter
Note the nMOS and pMOS transistors have the same
width. This is for illustration purposes only.
The width of the pMOS should be twice the nMOS to
provide the Same current.
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Example NAND3

• Horizontal N-diffusion and p-diffusion strips
• Vertical polysilicon gates
• Metal1 VDD rail at top
• Metal1 GND rail at bottom
• 32 l by 40 l
• Note the nMOS and pMOS transistors have
• the same width. This is for illustration
• Purposes only.

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Stick Diagrams

• Stick diagrams help plan layout quickly
• Need not be to scale
• Draw with color pencils or dry-erase markers

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Wiring Tracks

• A wiring track is the space required for a wire
• 4 l width, 4 l spacing from neighbor 8 l pitch
• Transistors also consume one wiring track

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Well spacing

• Wells must surround transistors by 6 l
• Implies 12 l between opposite transistor flavors
• Leaves room for one wire track

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Area Estimation

• Estimate area by counting wiring tracks
• Multiply by 8 to express in l