CellBased Aerial Image Analysis of Design Style for 45nm Generation Logic - PowerPoint PPT Presentation

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CellBased Aerial Image Analysis of Design Style for 45nm Generation Logic

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Cell-Based Aerial Image Analysis of Design Style for 45nm Generation Logic ... 90/65/45nm effects including high NA and vector diffraction, polarization, ... – PowerPoint PPT presentation

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Title: CellBased Aerial Image Analysis of Design Style for 45nm Generation Logic


1
Cell-Based Aerial Image Analysis of Design Style
for 45nm Generation Logic
  • Michael C. Smayling1, Valery Axelrad2, Michael P.
    Duane1, James Yu1, Hui W. Chen1 1Applied
    Materials, Inc., 2Sequoia Design Systems

2. Simulation
Advanced numerical models (SEQUOIA Design
Systems Cell Designer) capture 90/65/45nm
effects including high NA and vector diffraction,
polarization, aberrations, etc. Automatic
optimization algorithms used to calibrate
simulation models to match SEM data, predictive
accuracy is achieved. Effects design styles and
OPC evaluated by simulation and SEM.
4. Experimental Results
Aerial image
Entrance pupil illumination
Simulation
Simulation
SEM
Measurement locations for calibration
The litho process stability at 65nm
Calibrated simulation
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