[e-mail]

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• ???
• zjqiu_at_fudan.edu.cn
• ???????435?

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??? ?? ??? ???? ??? ?????????? ???
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???? ??? ???? ??? ?? ???
????? ???? ??????? ???? ???????
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• ??????
• ???
• ???????/????

?????????
????????????
??????
??????
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???????
????R(etch rate) ????????????????????
?????(etch uniformity) ??????????????????????
???S(Selectivity) ????????????
?????A(Anisotropy) ??????A0, ????A1, ????
??????(Undercut) ?????????
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???
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???? 1. ???????(????????) 2. ?????(???????10,???
??????) 3. ???? 4. ???????? 5. ????? 6. ????????

• ??????
• ???????????????,????
• ??????????(????)?????(????),???????

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• ??????????
• ???????(Mass transport)????????
• ??????????????????
• ??????????????

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????
?????????????
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? ? ? ?
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?4Si??KOH??
Si 2OH- 4H2O ?Si(OH)2 2H2 4OH-
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????lt111gt gt lt110gt gt lt100gt ????R(100)? 100 R(111)
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HNA??????
???
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(No Transcript)
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???????

• ???????????,?????????????
• (1)?????????,?????????
• (2)????????????,??????
• (3)???????????????,????????
• (4)?????????????????????,???

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????

• ????(????,????)
• ???????????(??????)
• ????(????,????)
• ??????? (????)
• ??????(????,?????)
• ??????

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???? ????
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??????-Ion Enhanced etching

• ???,XeF2?Si???
• ?Ar??,?Si???
• Ar???XeF2????,??????

????(??????????/???????????????????????????)??????
????/???????

• ??????????????????????????,?????????

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???RF????????PECVD???????
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Sputtering mode????????,?????(?????????,?????????
?) ????????,?????????????
RIE mode?????????????,??????????????,???????????
??
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??????(RIE)?????????????,?CF4,SiF6,Cl2,HBr?,?????
??O2,H2,Ar??O2 ????????
??????????????(volatile)
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CF4????
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(No Transcript)
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??Si3N4?SiO2??
Si4F?SiF4? SiO24F?SiF4? O2?
Si3N412F?3SiF4? 2N2?
????????????
10O2??????Si/SiO2???
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?CF4?????H2,??CFxF??????? ???SiO2Si?Si3N4Si???
?????
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??F/C?(???),???????? ??F/C?(???),?????????????
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????????

• ??????(??????)
• ???????(inhibitor)

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(No Transcript)
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???????
????
?????
?????
??????RIE ????????????CF4/O2
MEMS