FABRICATION OF MAGNETRON TARGETS BY SHOCK COMPRESSION

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FABRICATION OF MAGNETRON TARGETS BY SHOCK
COMPRESSION ?. ?. Rozen, S. G. Usatyi, D. V.
Karakozov, N. ?. Lyubomirova
X EPNM
Penza State University
40, Krasnaya Str, Penza, 440026, Russia e-mail
metal_at_pnzgu.ru
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Urgency job
X EPNM
World earnings of the technologies
allowing combining abilities of capacitive and
resistive touch displays will double by 2012 and
will account for 4,4 billion US dollars.
The given product is manufactured using targets
of magnetron type of evaporation.
Rather strict requirements are set for the
targets - high chemical purity and structural
uniformity throughout the target - high
density for reducing gas content in pores -
high stability in the conditions of temperature
changes and considerable temperature differences
over the thickness.
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X EPNM

• Producing the target one should pay
  attention to
• - the density
• - the grain size
• - the uniformity
• - the target fastening to the base
• - the technology of producing the
  resistive compact.
• There are two most widely-spread ways of
  producing the targets
• - powder metallurgy
• - and melting with the following
  casting.

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Objective of the work
X EPNM

• The objective of the work is
  development of the technology of shock-wave
  processing of the powder resistive material for
  the targets of the magnetron type of evaporation.
  
• As the standard test material to carry
  out the research the silicon resistive material
  powder has been chosen. Its chemical
  composition
• - Cr 52,5 55,5
• - Si 38,0 43,0
• - Co 4,5 7,5 .

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Explosive pressing arrangement
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Explosive compression
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• 1 - electrical detonator 2 explosive charge
  3 - piston plate 4 - conservation container
• 5 - press powder 6 metal plate , 7 rings 8
  target foot 9 plate foot 10 ground.

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Magnetron targetsby shock compression
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UVN 71-P3 plant
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Comparative data
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Target producing technique Electrophysical features Electrophysical features Electrophysical features
Target producing technique resources, heating cycle minimal resistive layer, nm deviation of the resistance from the nominal,
Casting technique - - -
Hot pressing technique 103 50 up to 1,0
Explosive pressing technique 104 30 up to 0,5
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Conclusions
X EPNM

• - it was shown that traditional technologies
  of producing articles from resistive materials do
  not provide achieving the performance criteria
  built in the nature of the matter
• - it was developed the pattern of explosive
  loading
• - it was received materials with high
  electrophysical characteristics.

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X EPNM

• Thank you for attention

40, Krasnaya Str, Penza, 440026, Russia e-mail
metal_at_pnzgu.ru