Surrey Ion Beam Centre An EPSRC sponsored centre for 25 years - PowerPoint PPT Presentation

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Surrey Ion Beam Centre An EPSRC sponsored centre for 25 years

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Photo-glasses. Si, GaAs. Slows electrochemical etching. direct ... Sub micron size microbeam with full scanning. Channelling Spectroscopy for damage analysis ... – PowerPoint PPT presentation

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Title: Surrey Ion Beam Centre An EPSRC sponsored centre for 25 years


1
Surrey Ion Beam CentreAn EPSRC sponsored centre
for 25 years
  • Investment
  • Support
  • 4M investment in machines and beam lines
  • Approx 1M per annum support
  • 4 academics
  • 7 RAs (2 senior RAs)
  • 3 technicians 0.5 secretary
  • Technology Transfer
  • 32 University departments around the UK
  • 22 local and international companies
  • 17 PhD projects
  • Supporting gt50 EPSRC grants worth gt25M

2
Surrey Ion Beam CentreAn EPSRC sponsored centre
for 25 years
  • Controllable Materials Modification
  • Facilities
  • 0.4-2MV High Energy Implanter
  • 2-200kV High Current Implanter
  • Implantation 2keV?4MeV (up to 10mA)
  • Sample size mm2 to 40cmx40cm
  • Hot (1000oC) or cold (LN)
  • Sample Chambers in class 100 clean room
  • Applications
  • Ion Beam Synthesis
  • Buried and surface oxides and silicides
  • Ion Implantation
  • Defect Engineering
  • Proton beam lithography
  • potentially nm resolution to 10?m depths

3
Surrey Ion Beam CentreAn EPSRC sponsored centre
for 25 years
MgB2 precipitates
  • Nano Applications of IBMM
  • Ion Beam Synthesis
  • Oxides and silicide surface layers
  • Buried layers
  • Conducting, insulating,
    superconducting, optical
  • Doping
  • Ultra-shallow junctions (10-20nm)
  • Defect Engineering
  • strain effects from dislocations
  • light emission from Si
  • control of TED (vacancy engineering)

100nm
20keV Boron
Implant
4
Surrey Ion Beam CentreAn EPSRC sponsored centre
for 25 years
  • Nano Applications of IBMM
  • Lithography
  • Proton Beam Lithography
  • direct write (30nm x 10?m)
  • fast as e-beam lithography
  • Photo-resists PMMA, SU8
  • make structures or
  • use as templates
  • Photo-glasses
  • Si, GaAs
  • Slows electrochemical etching
  • direct write MEMs Structures

Courtesy of Centre for Ion Beam Applications
Singapore
10um
5
Surrey Ion Beam CentreAn EPSRC sponsored centre
for 25 years
  • Advanced Materials Analysis
  • Facililties
  • 2MV Tandem
  • Techniques include RBS, EBS, ERD, PIXE, NRA
  • Sub micron size microbeam with full scanning
  • Channelling Spectroscopy for damage analysis
  • Fully automated collection and analysis
  • External Beam under development
  • Applications
  • Thin Film Depth Profiling
  • Compositional Analysis
  • Disorder Profiling of Crystals
  • 3-D elemental composition and mapping
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