Roll to roll for nanofabrication

1
Subproject NIL
Nanoimprint lithography is a polymer embossing
process requiring a mold, polymer and
temperature-pressure cycle. This parallel process
can yield feature sizes in the 10 nm range. The
key-objective of this subproject is to establish
a library of processes for specific applications
thereby pushing the design rules limits to
combine sub 10 nm with 10 µm features.
Fabrication of three-dimensional stamps by
electro-beam lithography, focused ion beam and
wet etching
Nanoimprinting for microfluidics. SEM micrographs
of the processes samples with the new design.
Long lanes of pores, ordered in groups of 3 or 5
rows, where imprinted. By dissolving the LOR
(Lift-off-resist) below the pores, long channels
are created which serve for fluid transport.
Structure of compound eyes fabricated by hot
embossing on thermoplastic.

• Roll to roll for nanofabrication
• Low cost
• High speed/high volume
• Large area
• New applications

The NIL introduction in the light emitting
technology allows the fabrication of high
performance substrates on large area with a low
cost process. A high increment of performances is
obtained with double layer nanostrtucturing of
the devices.
Right AFM image of roll to roll imprinted
structure on cellulose acetate film.
For more information, please contact Prof. Clivia
Sotomayor Torres (clivias_at_tyndall.ie)