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Session Paper No' Emerging Applications for Tunable Diode Laser, the Promise and the Problems

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Due to high resolution of measurement, spectral overlap can usually be avoided. ... to the ability to leverage high resolution (narrow laser linewidth) and fine ... – PowerPoint PPT presentation

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Title: Session Paper No' Emerging Applications for Tunable Diode Laser, the Promise and the Problems


1
Session / Paper No. Emerging Applications for
Tunable Diode Laser, the Promise and the Problems
  • Trevor Knittel, Don Wyatt, Alan Cowie, Jie Zhu
  • Analytical Specialties Inc. 910 Gemini, Houston,
    TX, 77058 
  •  Linh D. Le, J.D. Tate
  • The Dow Chemical Company, Freeport, TX.

2
TDL BACKGROUND
  • TDL has its origins in Research, Atmospheric
    measurements and Aerospace applications. Early
    limitations were due to the lack of available
    lasers that were low cost and reliable.
  • Emissions Open Path markets were opened up when
    the telecomm market developed low cost, long life
    laser sources. These applications tended to be
    for applications that had no attractive
    alternatives (NH3, HCl, HF, etc.). TDL analyzers
    have been installed in these applications for gt9
    years.
  • Combustion applications were the next step for
    TDL analyzers. Due to the ability to measure at
    high temperatures (up to 1500C) with a path
    average (vs. point) , and no sensor contact to
    the process, TDL was applied to many of the most
    severe service applications (high dust,
    corrosive, etc.).
  • PROCESS applications have not seen widespread TDL
    implementation (when compared to other analytical
    techniques such as paramagnetic, zirconia,
    infrared, GC, etc.
  • This is primarily due to requirements not seen in
    research, emissions or combustion applications
  • Measurement with simultaneous changes of
    background gases, temperature and pressure
  • Requirement to seal the process for corrosive and
    lethal service
  • Basic instrument features required such as
    auto-validation, user interface, valve control
  • PROCESS APPLICATIONS ALSO REQUIRE MUCH MORE
    ATTENTION TO APPLICATION DETAILS

3
TDL OPERATION
  • TDL is an optical measurement. The measured gas
    absorbs the laser light at a specific wavelength.
    The amount of light absorbed is a function of
    gas concentration, pressure, temperature and
    optical path length.
  • Method of operation
  • The system electronics control the current fed to
    the laser (1)
  • The laser (2) wavelength changes with current
  • The modulated laser light is collimated to a
    circular beam (2), and sent through process
    windows (3) and the process gas
  • The light transmitted through the process gas
    strikes a detector (4)
  • This signal will show an absorption (loss of
    light) at the wavelengths the gas absorbs

1
3
2
4
Signal at Detector
Current ramp to laser
4
POSSIBILITIES
  • Accuracy improvements
  • Speed of analysis
  • Representative measurement
  • Measurement under extremely aggressive process
    conditions
  • Installation cost reduction
  • Operational cost reduction
  • Positive indication of operation

5
DIFFICULTIES
  • Window fouling
  • Particulate loading
  • Sensitivity drift issues at high temperatures
    or short path lengths
  • Temperature/pressure compensation
  • Calibration / validation

6
ACCURACY IMPROVEMENTS
  • Accuracy improvements generally fall into three
    categories
  • Interference Free Measurement. Due to high
    resolution of measurement, spectral overlap can
    usually be avoided. If the measurement method is
    immune to foreign gas broadening a truly
    interference free measurement is possible.
  • Speed of Analysis. With no sample transport and
    conditioning delays and a fast analysis cycle
    (1-5seconds) process changes can be seen that are
    not visible to slower analysis methods
    (continuous or batch)
  • Representative Measurement. With no requirement
    to remove a point sample (probe) the entire
    process is measured eliminating distribution
    errors. Also with the possibility of measurement
    at process conditions the sample is not altered
    prior to analysis (i.e. sample cooling and loss
    of moisture heavy components)

7
INTERFERENCE REJECTION
  • Some interference typically considered are,
    spectral (photometers/spectrometers),
    paramagnetic background gases (paramagnetic
    oxygen), and hydrocarbons for zirconia oxygen.
  • TDL in addition to spectral interference must
    consider foreign gas (collisional) broadening.
  • Spectral interference is generally easy to
    overcome due to the ability to leverage high
    resolution (narrow laser linewidth) and fine
    rotational structure of target gas.
  • Foreign gas broadening can be minimized with
    fitting or eliminated with peak area integration
    (unfitted)

Interference Free CO2 Peaks
8
EXAMPLE OF INTERFERENCE REJECTION IN FIELD
  • Aggressive waste destruction system with TDL
    (green trend) installed downstream of 2-zirconia
    analyzers (red-blue trend)
  • All analyzers dropped during change in
    incinerator load. One zirconia dropped below 0
    (not possible) other dropped to 1 oxygen.
    Correlation with CO data from CEMS suggests that
    both zirconia analyzers dropped artificially low
    (possible due to unburned hydrocarbons)

9
SPEED
  • Depending on process dynamics extractive
    analyzers may miss process events due to sample
    transport and conditioning lag times
  • Short duration excursions (process or fault
    driven) may be missed or smoothed due to
    measurement delays
  • TDL can offer lt5s analysis times with measurement
    through the process
  • Diagnostics can prove measurement validity if
    operations questions data

10
SPEED II
  • Both systems exposed to 4.91ppm H2O for one hour,
    then returned to 0 ppm N2
  • Maximum P2O5 response after 1 hour exposure
    2.6ppm

8ppm short term exposure missed by slower
response analyzer
11
REPRESENTATIVE MEASUREMENT
  • Representative measurement can be achieved by
    measuring in the process or at process conditions
    (temperature, pressure, etc.)
  • Two main advantages are for
  • Processes were there is a spatial distribution of
    the analyte (i.e. large scale combustion)
  • Processes with high levels of water that need to
    be removed for extractive analysis (net vs. wet
    measurement)

12
DIAGNOSTICS
  • IF the analyzer has the ability to automatically
    capture and store spectra diagnostic ability is
    greatly improved.
  • In this example the TDL readings were questioned
    since the measurement speed showed reading
    spikes that were not expected.
  • HISTORICAL spectra was already present in the
    analyzer allowing analysis and confidence that
    the readings were correct.

13
TRANSMISSION LOSSES (WINDOW FOULING, PARTICULATE)
  • Since both resonant (peak) and non-resonant
    (baseline) information is collected during each
    scan, loss of power has no significant effect on
    the measurement until gt95 of laser power is
    lost. Pathlength can be reduced with insertion
    tubes to overcome laser power losses.
  • Window fouling presents more difficulty since
    coatings can affect the optical surface and beam
    quality. Generally this can be overcome with
    protective purge in front of the process window
    (measurement is now non-contacting). Window
    purge is possible for both in-situ and close
    coupled extractive installations.

14
AGGRESSIVE SERVICE
  • Dealing with a non-conditioned sample requires
    careful attention to the process interface
    design.
  • For high pressures and aggressive/lethal samples
    the process seal must be independent of alignment
    mechanisms.
  • Window and seal materials must be carefully
    selected for process conditions (i.e. sapphire)
  • Window purge will protect optics from excessive
    temperature and coating/fouling

15
EFFECT OF OPTICAL PATHLENGTH, TEMPERATURE AND
PRESSURE
  • The fundamental performance limitation of TDL
    systems is typically etalon noise/drift
    (constructive interference from laser
    reflections).
  • Etalon measurement interference is difficult to
    eliminate but can be minimize with proper optical
    design and signal processing.
  • Etalon noise/drift is typically an absolute error
    (independent of measurement level). As such the
    measurement equivalent is affected by
  • Optical pathlength. Linear relationship, as
    pathlength increases the etalon error
    contribution is decreased.
  • Process gas temperature. Most lines will
    decrease with temperature, for example one
    candidate oxygen line will decrease by 50 when
    increasing temperature from 80F to 550F. For
    high temperature applications it is sometimes
    possible to select lines that increase (or
    decrease less) with temperature
  • Process gas pressure. With peak area integration
    pressure has a linear effect. Higher pressure
    process conditions will proportionally reduce
    etalon noise/drift.
  • For reference most suppliers supply performance
    data at a typical process condition (25C, 1m
    path, 1barA). It is important to evaluate the
    effects of process conditions on the measurement
    performance (noise, drift, accuracy)

16
PRESSURE/TEMPERATURE COMPENSATION
  • Peak height and area are pressure and temperature
    dependant
  • Pressure effect on peak area is linear, pressure
    effect on peak height is non linear
  • Temperature effect is non-linear for peak height
    or area
  • Pressure and temperature can be compensated for
    real time by feeding 4-20mA signal to analyzer
  • Pressure and temperature tests should be
    performed on the analyzer under controlled
    (offline) conditions to validate compensation
    curves.
  • Pressure can be simple to generate and test, and
    is easy to compensate (esp. since area is linear
    compensation)
  • Temperature is more difficult when targeting
    measurements gt1000C. Specific test equipment is
    needed.
  • As with any analytical measurement when
    developing calibrations and compensation curves
    accurate tests and standards are critical
    especially when operating under uncontrolled
    conditions

High Temperature gt1200C Test Furnace
17
INSTALLATION OPTIONS
  • CROSS STACK/PIPE (IN-SITU)
  • Measurement across the process
  • Path integrated measurement
  • BYPASS LEG
  • Large diameter pipe run
  • Process flow through measurement leg or-
  • Process slipstream through measurement leg
  • Allows isolation from process
  • FLOW CELL
  • Pull or push sample through flow cell

18
VALIDATION
  • Full off-line calibration/check using flow cell
  • Zero and span
  • Block in place calibration/check for bypass and
    extractive applications
  • Zero and span
  • On line dynamic spiking using serial bump cell
  • Manual or Auto initiate
  • Allows adding successive spikes of gas being
    measured
  • Validates response
  • Validates response level
  • No functional test of zero
  • Positive indication of operation for complete
    analysis system
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