Existing Microbeam Facilities

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Existing Microbeam Facilities

• I.C. Noyan
• IBM Research Division,
• Yorktown Heights.
• Dept. of Appl. Phys. Appl. Math.
• Columbia University

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• Microbeam facilities exist in all major
  synchrotrons.
• I will discuss the capabilities of
• Spring-8
• ESRF
• APS
• ALS
• CHESS

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Important Parameters

• Beam size on sample
• Not necessarily equal
• to the beam size at focus point.
• Divergence
• These terms may differ in vertical and horizontal
  directions.
• of photons in beam (intensity)
• Divergence, beam intensity and the scattering
  process must be evaluated together.
• Only the photons within the acceptance aperture
  of the process are relevant.

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• The data shown are either from the web pages or
  publications as of 1/2003.
• The URL for each institution is referenced once
  at the beginning of each section.
• Other data is referenced as required.

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SPring-8 (Super Photon ring-8 GeV)
http//www.spring8.or.jp/ENGLISH/
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• BL24XU-Hyogo Beamline
• Figure-8 undulator, vertically polarized X-ray
  beam.
• Vertical axis double crystal monochromator
• Beam size 100 mm x 60 mm at limiting slit (65 m
  from source)
• Horizontal/vertical divergence 16/1 mrad _at_ slit.
• Condensing optic Asymmetric reflection (511 -)
  from 100 surface crystals.
• Beam size _at_ sample 7.3 mm x 6.4 mm
  (horizontal/vertical),
• Beam divergence _at_ sample 7.7/5.3 mrad

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Kimura, et. al., APL Vol.77 9, pp. 1286-1288
(2000)
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http//www.esrf.fr
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µ-FID Micro-Fluorescence, Imaging and
Diffraction,
http//www.esrf.fr/exp_facilities/ID22/
Optics Flat Si mirror with 2 coatings
Horizontal deflection 0.15ordm (2.6 mrad)
Cut-off energies Si strip 12 keV Pd strip
24 keV Pt strip 32 keV Vertical double flat
crystal monochromator, fixed exit cam system
(Kohzu) Angular range 3-30 deg. Energy range
4-37 keV for Si111 crystals 7-72 keV for
Si311 crystals Micro-focusing elements
Bragg-Fresnel lenses (BFL) Fresnel zone plates
(FZP) Compound refractive lenses (CRL) Size of
beam at the sample location (V x H) 0.85 mm x
1.5 mm _at_ 40 m (EH1) and 1.2 x 2.2 _at_ 60 m (EH2).
109, 1012 photons/sec._at_ sample.
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Detectors Si(Li) detector Si drift diode
detector PIN diodes, ionization chambers High
resolution CCD cameras Medium resolution CCD
camera gas filled (position sensitive) detector
Beam Monochromatic (4-35 keV), PINK beam mode
High energy bandwidth beams obtained directly
from the undulator and mirror. These beams span
several full undulator harmonics.
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• End Station
• Two large experimental hutches (30m2 each)
  accept differentset-ups
• The microprobe facility on a 2.5 x 1.2 m 2
  granite optical table.
• focusing stage,
• pinhole stage,
• sample scanning stage with 2 sample holders
  (goniohead or slide holder)
• Video microscope, fluorescence, diffraction and
  normalization detectors as well as a high/medium
  resolution CCD camera stage.
• A 6 circle diffractometer, featuring a 3 mm
  sphere of confusion is installed in the first
  experimental hutch and is operated jointly with
  the Univ. of Karlsruhe.
• The imaging and tomography set-up second hutch,
  includes a high resolution rotation sample stage,
  a CCD X-ray camera standing on an optical bench
  and an optical microscope for alignment.
• Typical distance between the beam path and the
  surface of the tableis 38 cm. The experiment is
  currently operated in air but special sample
  chambers can be mounted for in vacuum
  measurements.

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General Description of ID18F
Schematic lay-out of the ID18 beam-line and the
ID18F user end-station
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The microprobe set-up is situated on a movable
granite table in the 3rd hutch of the ID18
beamline at about 59 m distance from the X-ray
source. For the demagnification of the
synchrotron source and for creating the
micro-beam, parabolic compound refractive lens
(CRL) is used. The CRL is composed of different
number of individual Al lenses depending on the
energy of the focused beam. The typical focal
distance is between 0.5-1.2 m depending on the
energy of the incoming beam leaving a relatively
large place between the sample and focusing
device for placing e.g. beam-shaping (pin-hole)
or beam monitoring (photodiode, ionization
chamber) elements in between.
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The size of the focused beam is typically 1-2
micron vertically and 12-15 micron horizontally
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Imaging and tomography Phase-contrast imaging
Phase-contrast images of dry and wet samples can
be taken on high-resolution film or by means of a
high-resolution CCD camera. Typical exposure
times are 10 ms to 5 s. Phase-contrast
microtomography Collecting a set of phase
contrast images from different orientations of a
sample in a parallel beam, it is already possible
to perform 3D reconstruction (back-projection
algorithm) by tomography at the micrometer scale.
Micro-topography, The high contrast and high
resolution achievable is be used on the micro-FID
beamline to observe details of the very fine
topography of exotic or modified crystals used in
microelectronics or laser technology Holography
and interferometry Gabor in-line holography
(planar reference wave) or Fourrier holography
(spherical reference wave) are feasible. The fine
interference pattern obtained can be used for the
high accuracy determination of optical density
and refraction index.
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The principal aim of the Microfocus Beamline is
to provide small focal spots for diffraction and
small-angle X-ray scattering (SAXS). Both single
crystal and scanning diffraction (SXD)
experiments are performed. Other applications,
like scanning X-ray microfluorescence (SXRF), are
feasible.
http//www.esrf.fr/exp_facilities/ID13/
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• The main instrumental setups available for users
  are
• The microgoniometer was developed for protein
  crystallography (PX) but can also be used for
  small- to medium cell crystallography. Typical
  beam sizes available are 5/10/30 mm based on a
  condensing mirror and collimators.
• The scanning setup was developed for wide- and
  small-angle scattering. Typical beam sizes used
  are currently 2/5/10 mm based on a condensing
  mirror in combination with tapered glass
  capillaries or collimators.
• The scanning setup can also be used for
  SAXS-experiments. For a beam size of about 10 mm,
  the first order spacing of dry collagen can be
  resolved (65 nm). A 130 mm entrance window MAR
  CCD with 16 bit readout ( 4 sec readout/frame)
  or a XIDIS detector with 12 bit readout ( 0.1
  sec readout/frame) are used for scanning.

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• X-rays are guided inside the
• capillaries by total external
• reflection.
• Critical angle depends on
• material and l. 0.1-10 mrad.
• Capillaries tend to be very
• long (many cm) with a small
• slope.
• Usually 1 to 3 reflections.
• Non-imaging optic.
• Material Pb-glass, r5.3 g/cm3,
• Att. Length 40 mm _at_12 keV, qcrit3 mrad.

http//www-hasylab.desy.de/science/groups/syxrf/ca
pillar.html
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Advanced Photon Source Argonne, IL
http//www.aps.anl.gov/
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• Sector 2 Micro-Techniques Group
• High-resolution imaging and diffraction
  experiments in the
• 1-4 keV and 5-35 keV energy regions.
• Develop new x-ray optics and techniques, with an
  emphasis
• on nanofocusing, coherence, 3D, and
  high-throughput methods.

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• Fresnel zone plate A circularly symmetric array
  of
• annular zones which are alternately
• transparent and opaque.
• Provide diffraction limited x-ray imaging
• with a spatial resolution (in first order)
• approaching the dimension of the
• minimum, i.e., outermost, zone width.
• Provides many imaging orders.
• Different orders are focused at different
• points.
• Monochromatic and spatially coherent
• illumination of the zone plate is required
• in order to get a diffraction-limited
• focal spot size.

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http//xuv.byu.edu/html/docs/previous_research/EUV
_Imager/Documentation/part4/4fresnel.htm
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2-ID-D - Sector 2, Insertion Device Branch
Beamline
High-resolution fluorescence and diffraction
imaging, 
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Optical micrograph.
Strain effects
Small beams are needed.
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2-ID-E - Sector 2, Insertion Side Device Branch
Beamline
Sub-micron x-ray fluorescence mapping
Detector 3-element energy-dispersive, DE 160
eV 
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2-ID-B - Sector 2, Insertion Device Branch
Beamline
High-resolution imaging, Coherent scattering
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devices
devices
devices
1. A projective plot of the reconstruction of
the integrated circuit. 2. Bayesian
reconstruction of the integrated circuit
interconnect using same data as in 1. 3. Normal
incidence projection of an integrated circuit
interconnect with an electromigration void. 4.
Bayesian reconstruction of the ragged end of the
aluminum interconnect shown in the right side in
Fig. 3.
Z. H. Levine, A.R. Kalukin, M. Kuhn, S.P. Frigo,
I. McNulty, C.C. Retsch, Y. Wang, U. Arp, T.
Lucatorto, B. Ravel, C. Tarrio, J. Appl. Phys.
87, 4483 (2000).
The last two years has seen an improvement in
both spatial resolution an overall image quality
in the tomography of integrated circuit
components at beamline 2-ID-B. In collaboration
primarily with a research group at the National
Institute of Standards and Technology, we have
been developing tomographic imaging techniques
capable of resolving sub-micron sized structures,
hence the name
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MHATT-CAT-Sector7 /UNICAT Beamline 34

• White beam/monochromatic rad.
• K-B mirrors
• Spot size1 micrometer diam.
• Divergence2-4 mrad.
• Grain by grain strain/texture mapping.
• Depth resolved strain mapping.

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Sample geometry
G. Ice, B. Larson, Nature 415, 887 - 890 (2002)
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ALS-Berkeley Lab, Berkeley, CA
http//www-als.lbl.gov/
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CHESS, Ithaca, NY
B2 bend magnet station, Tapered capillary
optic, Smallest beam 1000 A diameter _at_ 6
keV. 106 photons/sec at the sample _at_ 12.3
keV (multilayer mono.) Microstructure evaluation
(Laue photos).
http//www.chess.cornell.edu/
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Summary

• There are quite exciting machines that are doing
  microbeam x-ray analysis.
• This is a hot area
• ESRF now reports microbeam results as a separate
  category.
• All have advantages and limitations.
• Ease of access,
• Multiple techniques with minimal set-up.
• New rings are being designed with microspot
  beamlines.

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  Diamond will be built at the Rutherford
Appleton Laboratory and is due to be available to
users in September 2006. 24 cells/ 3.0 GeV
ring. Undulator beams up to 20keV High flux from
multipole wigglers and wavelength shifters to
energies greater than 100keV.
Bending magnet sources from 40 keV to the
IR.  Microbeamline.   Source undulator   Optics
double crystal monochromator with
micro-focussing giving Wavelength range 0.7Å
1.3Å Bandpass 10-4 Convergence Up to
2mrad Energy stability 0.25eV Beamsize at
sample 5 100?m Positional stability 1 RMS
on 5s timescale 3 RMS on 1hr
timescale Flux 1012 ph/s in 30?m x 30?m _at_
1Å  
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Goniostat Single axis with 1?m sphere of
confusion, Detectors Area detector with no
more than 1s readout time Fluorescence
detector Auto-loading and auto-changing of
sample. Auto-alignment of sample both optically
and with X-rays   Sample cryogenic cooling to 4
100K
The proposed machine at NSLS will provide
ease-of-use and simultaneous analysis
capabilities not available at other machines.