Title: Growth of InN Films by Cluster Beam Epitaxy and RF Plasma-assisted MBE
1Growth of InN Films byCluster Beam Epitaxy and
RF Plasma-assisted MBE
- T.C. Chen, C. Thomidis, J. Abell, T. Xu and
Theodore D. Moustakas - Department of Electrical and Computer Engineering
- Boston University
- Support AFOSR MURI (Monitored by Dr. T.
Steiner) - ONR (Monitored by Dr. C. Wood)
-
AFOSR InN Workshop 2 Kailua-Kona, Hawaii 9-13
January, 2005
2Outline
- Discussion of the Cluster Beam Epitaxy method
- - Formation and characterization of
nitrogen clusters - Growth of InN films by RF plasma MBE
- - Nucleation
- - Film adherence
- - Formation of QDs
- Growth of InN films by the Cluster Beam Epitaxy
method - - Nucleation
- -Structure
- -Film adherence
- Physical Properties
- -Transport
- - Optical absorption
- - Electron effective mass
- Conclusion
3Methods used for the growth of InN
- RF plasma MBE
-
- Gas-cluster beam epitaxy
-
4What is Cluster Beam Epitaxy?
- Neutral clusters of several thousand
atoms/molecules are formed by supersonic
expansion through a small nozzle at high
stagnation pressure. - The clusters are singly or doubly ionized by
electron impact - High mass to charge (M/Q) ratio
(potential for high growth rate). - Controlled energy is added to the ionized
clusters by use of acceleration potentials. - The energy of the individual atoms is low even
if the total energy of the cluster is high. - Control of the energy of impinging flux atoms
on the substrate can enhance - adatom migration and dopant
incorporation. - The ionized clusters deposit high energy density
into a small volume of the target material - High chemical reactivity effects (Chemistry at
104 to 105 K). - Deposition of films at low temperatures .
- Non-linear sputtering and implantation
effects. -
5Interaction of Ionized Clusters with a Target
6Difference between impacts of cluster and monomer
ions
7N2 Cluster Distribution determined by
time-of-flight measurements
- Nitrogen clusters with average size of 2000
molecules have been formed (stagnation
pressuregt14 Atm) -
- Clusters with 2000 molecules, accelerated at
20kV, disintegrate into molecules with energy of
10 eV, - which is sufficient to break them into
nitrogen atoms (required energy 9.5eV). - - Use a magnetic filter to remove light
clusters, which produce very energetic molecules
8 Growth of InN films by RF-plasma MBE
- Substrate (0001) Sapphire
- Nitridation ( at 250 C to 550 C)
- Nucleation
- - An InN buffer grown at 3000 C
- A nitrogen polar GaN-template grown at 7500 C
- InN Films
- - Growth temperature 550-560C
- - Growth rate 1.2 mm/h
9AFM image of (0001) sapphire after nitridation at
250 C with the RF-plasma source
- RF power 400 W
- Substrate scratches due to
- polishing were not affected
- by the nitridation process
10Initial growth of InN films on (000-1) GaN
templates
1mm
These data suggest that threading dislocations
should occur primarily at domain boundaries
11 SEM images of GaN and InN films grown
sequentiallyusing the RF-Plasma Source
GaN
InN
- Films tend to delaminate when they are more
than 23 mm thick due to their compressive
stress. - - Delamination occurs upon exposure to the
atmosphere - - The delaminated films are very strong and
can be used for the characterization of the - properties of stress free InN films
12Structure of InN Films nucleated with a low
temperature InN-buffer
RHEED of InN Buffer
RHEED of InN Film
- Both RHEED and XRD indicate that the films are
single - crystals.
13SEM images of an InN film grown on LT InN buffer
- Films as thick as 6mm have been grown on a InN
buffer - However, these films tend to delaminate during
growth
14InN Quantum Dots/Islands
(50 s)
- Dot Density 2 x 109 dots/cm2
- Mean Height 15 nm
- Mean Diameter 115 nm
10 mm x 10 mm AFM Height Image
15 Growth of InN films by Cluster Beam Epitaxy
- Substrate (0001) Sapphire
- Nitridation ( at 250 C)
- - Scratches due to mechanical polishing are
removed (Substrate smoothing) - - Substrate surface morphology depends
strongly on cluster acceleration voltage - Nucleation
- - An InN buffer grown at 3000 C
-
- InN Films
- - Growth temperature 550-560C
-
16Growth of InN films with the N2-Cluster Source
- This method has the potential to address the
issue of delamination of the films from the
substrate due to the energetic nature of the
clusters - InN films using only the cluster source
- InN films using both sources together
- The nucleation steps were done with the
cluster source and the InN film - was grown with RF plasma source
17AFM images of sapphire substrates before and
after nitridation using nitrogen clusters of
various energies.
- The bare substrates have
- scratches due to mechanical
- polishing.
- The nitrogen clusters remove
- the scratches.
- - The smoother surface
- morphology is obtained at
- 15 KV acceleration voltage
18XRD data of a thin InN film grown by the Cluster
Beam Epitaxy method
19SEM images of an InN film grown with both
nitrogen sources
- The cluster source was used for the nitridation
and InN buffer steps. - The RF plasma source was used to grow the high
temperature InN film - These films adhere well to the substrate.
20Transport data of InN Films
- The grown InN films are auto-doped n-type with
carrier concentration higher than 3x1018/cm3. - The best RT electron mobility obtained is 1130
cm2/V.s
21Optical absorption constant of a 900nm thick InN
film
- The energy gap of InN films, determined by
transmission measurements, was found to be 0.75eV
22IR Reflectivity data of InN Films(determination
of TO Phonon and electron effective mass)
Sample Name N (cm-3) eh TO Phonon Frequency (cm-1) Plasma Frequency (cm-1) m
E104 Free standing 7.20E18 9 477 891 0.091
E107 2.26E19 9 470 1400 0.115
23Effective Mass vs. Energy Gap for Direct Band-gap
Semiconductors
k.p method
24Conclusions
- InN films were grown in the same MBE system using
either an RF Plasma source or a Cluster Source
for the activation of nitrogen - The films grown by the plasma source tend to
delaminate as they become thicker. - XRD of the films grown by the cluster source
have shown, in addition to the (0002) - diffraction, an additional small peak
attributed to (10-11) diffraction of InN. - Hybrid films in which the nucleation layers
were deposited with the cluster source - and the rest of the film with the plasma
source are the most promising. -
- The films are auto-doped n-type with carrier
concentration larger than - 3x1018 cm-3. The best RT electron
mobility is 1130 cm2/vs - Transmission measurements show the energy gap of
0.75eV - The electron effective mass was determined by IR
reflectivity measurements to be 0.09m0. The
result is in qualitative agreement with the
predictions of the k.p method..