Applications of Multivariable Control, Modeling, Signal Processing and Optimization for the Microlit

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Applications of Multivariable Control, Modeling,
Signal Processing and Optimization for the
Microlithographic ProcessThomas Kailath,
Stanford UniversityMURI, year started 1995
email tk_at_rascals.stanford.edu
Web URL http//www-isl.stanford.edu/groups/MURI
Oct. 5, 1998

• Apply mathematical systems science to enhance
  microlithographic capabilities for DOD interests
• faster integrated circuits
• increased memory density
• improved yields

• Scientific/Technical Approaches
• Nonlinear Inverse Scattering Problems
• MEMS for Photoresist Deposition
• Fast Multipole Methods
• Multivariable Thermal Designs
• Process Sensors using Ultrasonics
• Subspace Methods for Alignment

• Accomplishments
• Technology Transitions
• Numerical Technologies, Inc. (Fast Algorithms)
• Applied Materials, Inc. (Integrated Thermal
  System)
• New MEMS Sensors and Actuators
• New Alignment Algorithms
• New Techniques for Fast Inspection and
  Phase-Shifting Mask Design