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A Level-Set Method for Modeling Epitaxial Growth and Self-Organization of Quantum Dots

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Title: A Level-Set Method for Modeling Epitaxial Growth and Self-Organization of Quantum Dots


1
A Level-Set Method for Modeling Epitaxial Growth
and Self-Organization of Quantum Dots
Christian Ratsch, UCLA, Department of Mathematics
Santa Barbara, Jan. 31, 2005
Collaborators
  • Russel Caflisch
  • Xiabin Niu
  • Max Petersen
  • Raffaello Vardavas

NSF and DARPA
2
What is Epitaxial Growth?
epi taxis on arrangement
3
Why do we care about Modeling Epitaxial Growth?
  • Many devices for opto-electronic application are
    multilayer structures grown by epitaxial growth.
  • Interface morphology is critical for performance
  • Theoretical understanding of epitaxial growth
    will help improve performance, and produce new
    structures.
  • Methods used for modeling epitaxial growth
  • KMC simulations Completely stochastic method
  • Continuum Models PDE for film height, but only
    valid for thick layers
  • New Approach Island dynamics model using level
    sets

4
KMC Simulation of a Cubic, Solid-on-Solid Model
D G0 exp(-ES/kT)
F
Ddet D exp(-EN/kT)
Ddet,2 D exp(-2EN/kT)
ES Surface bond energy EN Nearest neighbor bond
energy G0 Prefactor O(1013s-1)
  • Parameters that can be calculated from first
    principles (e.g., DFT)
  • Completely stochastic approach
  • But small computational timestep is required

5
KMC Simulations Effect of Nearest Neighbor Bond
EN
Large EN Irreversible Growth
Small EN Compact Islands
6
KMC Simulation for Equilibrium Structures of
III/V Semiconductors
Experiment (Barvosa-Carter, Zinck)
KMC Simulation (Grosse, Gyure)
Similar work by Kratzer and Scheffler Itoh and
Vvedensky
380C 0.083 Ml/s 60 min anneal
440C 0.083 Ml/s 20 min anneal
Problem Detailed KMC simulations are extremely
slow !
F. Grosse et al., Phys. Rev. B66, 075320 (2002)
7
Outline
  • Introduction
  • The basic island dynamics model using the level
    set method
  • Include Reversibility Ostwald Ripening
  • Include spatially varying, anisotropic diffusion
  • self-organization of islands

8
The Island Dynamics Model for Epitaxial Growth
9
The Level Set Method Schematic
  • Continuous level set function is resolved on a
    discrete numerical grid
  • Method is continuous in plane (but atomic
    resolution is possible !), but has discrete
    height resolution

10
The Basic Level Set Formalism for Irreversible
Aggregation
  • Governing Equation
  • Boundary condition

C. Ratsch et al., Phys. Rev. B 65, 195403 (2002)
11
Typical Snapshots of Behavior of the Model
t0.1
j
r
t0.5
12
Numerical Details
  • Level Set Function
  • 3rd order essentially non-oscillatory (ENO)
    scheme for spatial part of levelset function
  • 3rd order Runge-Kutta for temporal part
  • Diffusion Equation
  • Implicit scheme to solve diffusion equation
    (Backward Euler)
  • Use ghost-fluid method to make matrix symmetric
  • Use PCG Solver (Preconditioned Conjugate
    Gradient)

13
Essentially-Non-Oscillatory (ENO) Schemes
14
Numerical Details
  • Level Set Function
  • 3rd order essentially non-oscillatory (ENO)
    scheme for spatial part of levelset function
  • 3rd order Runge-Kutta for temporal part
  • Diffusion Equation
  • Implicit scheme to solve diffusion equation
    (Backward Euler)
  • Use ghost-fluid method to make matrix symmetric
  • Use PCG Solver (Preconditioned Conjugate
    Gradient)

15
Solution of Diffusion Equation
16
Fluctuations need to be included in nucleation of
islands
Nucleation Rate
rmax
r
C. Ratsch et al., Phys. Rev. B 61, R10598 (2000)
17
A Typical Level Set Simulation
18
Outline
  • Introduction
  • The basic island dynamics model using the level
    set method
  • Include Reversibility Ostwald Ripening
  • Include spatially varying, anisotropic diffusion
  • self-organization of islands

19
Extension to Reversibility
  • So far, all results were for irreversible
    aggregation but at higher temperatures, atoms
    can also detach from the island boundary
  • Dilemma in Atomistic Models Frequent detachment
    and subsequent re-attachment of atoms from
    islands Significant computational cost !
  • In Levelset formalism Simply modify velocity
    (via a modified boundary condition), but keep
    timestep fixed
  • Stochastic break-up for small islands is important
  • Boundary condition

20
Details of stochastic break-up
  • For islands larger than a critical size,
    detachment is accounted for via the (non-zero)
    boundary condition
  • For islands smaller than this critical size,
    detachment is done stochastically, and we use an
    irreversible boundary condition (to avoid
    over-counting)
  • calculate probability to shrink by 1, 2, 3, ..
    atoms this probability is related to detachment
    rate.
  • shrink the island by this many atoms
  • atoms are distributed in a zone that corresponds
    to diffusion area
  • Note our critical size is not what is typical
    called critical island size. It is a numerical
    parameter, that has to be chosen and tested. If
    chosen properly, results are independent of it.

21
Sharpening of Island Size Distribution with
Increasing Detachment Rate
Experimental Data for Fe/Fe(001), Stroscio and
Pierce, Phys. Rev. B 49 (1994)
Petersen, Ratsch, Caflisch, Zangwill, Phys. Rev.
E 64, 061602 (2001).
22
Scaling of Computational Time
Almost no increase in computational time due to
mean-field treatment of fast events
23
Ostwald Ripening
M. Petersen, A. Zangwill, and C. Ratsch, Surf.
Science 536, 55 (2003).
24
Outline
  • Introduction
  • The basic island dynamics model using the level
    set method
  • Include Reversibility Ostwald Ripening
  • Include spatially varying, anisotropic diffusion
  • self-organization of islands

25
Nucleation and Growth on Buried Defect Lines
Results of Xie et al. (UCLA, Materials Science
Dept.)
  • Growth on Ge on relaxed SiGe buffer layer
  • Dislocation lines are buried underneath.
  • Lead to strain field
  • This can alter potential energy surface
  • Anisotropic diffusion
  • Spatially varying diffusion
  • Hypothesis
  • Nucleation occurs in regions of fast diffusion

Level Set formalism is ideally suited to
incorporate anisotropic, spatially varying
diffusion without extra computational cost
26
Modifications to the Level Set Formalism for
non-constant Diffusion
27
What we have done so far
Assume a simple form of the variation of the
potential energy surface (i.e., sinusoidal) For
simplicity, we look at extreme cases only
variation of adsorption energy, or only variation
of transition energy (real case typically
in-between)
28
Isotropic Diffusion with Sinusoidal Variation in
x-Direction
Only variation of transition energy, and constant
adsorption energy
  • Islands nucleate in regions of fast diffusion
  • Little subsequent nucleation in regions of slow
    diffusion

29
Comparison with Experimental Results
Results of Xie et al. (UCLA, Materials Science
Dept.)
Simulations
30
Anisotropic Diffusion with Sinusoidal Variation
in x-Direction
31
Isotropic Diffusion with Sinusoidal Variation in
x- and y-Direction
32
(No Transcript)
33
Anisotropic Diffusion with Variation of
Adsorption Energy
What is the effect of thermodynamic drift ?
34
Transition from thermodynamically to kinetically
controlled diffusion
Constant adsorption energy (no drift)
Constant transition energy (thermodynamic drift)
But In all cases, diffusion constant D has the
same form
35
What is next with spatially varying diffusion?
  • So far, we have assumed that the potential energy
    surface is modified externally (I.e., buried
    defects), and is independent of growing film
  • Next, we want to couple this model with an
    elastic model (Caflisch et al., in progress)
  • Solve elastic equations after every timestep
  • Modify potential energy surface (I.e., diffusion,
    detachment) accordingly
  • This can be done at every timestep, because the
    timestep is significantly larger than in an
    atomistic simulation

36
Conclusions
  • We have developed a numerically stable and
    accurate level set method to describe epitaxial
    growth.
  • The model is very efficient when processes with
    vastly different rates need to be considered
  • This framework is ideally suited to include
    anisotropic, spatially varying diffusion (that
    might be a result of strain)
  • Islands nucleate preferentially in regions of
    fast diffusion (when the adsorption energy is
    constant)
  • However, a strong drift term can dominate over
    fast diffusion
  • A properly modified potential energy surface can
    be exploited to obtain a high regularity in the
    arrangement of islands.

More details and transparencies of this talk can
be found at www.math.ucla.edu/cratsch
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