The Birck Nanotechnology Center

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The Birck Nanotechnology Center
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The Birck Nanotechnology CenterSpecifically
Designed for Interdisciplinary Collaborative
Research in Nanotechnology
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Birck Nanotechnology CenterFacility

• Laboratories
• Cleanroom
• Offices
• Conferencing and Collaborating Areas

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First Floor Block Diagram
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First Floor Block Diagram
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First Floor Block Diagram
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First Floor Block Diagram
Atomic Force Microscopy
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First Floor Block Diagram
Surface Analysis
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Second Floor Block Diagram
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Second Floor Block Diagram
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Second Floor Block Diagram
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Second Floor Block Diagram
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Second Floor Block Diagram
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Second Floor Block Diagram
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Second Floor Block Diagram
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Laboratories

• Modular System
• 88 modules
• 11 x 22
• Laboratories consist of various numbers of
  modules, from 1 to 7

A Single-Module Laboratory
A Three-Module Laboratory
A Five-Module Laboratory
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Laboratories

• Isolated vibration slab (first floor)
• Meets NIST-A Standard
• EMI Control
• 0.1 milligauss in sweet spots in each
  laboratory
• Temperature Control
• 1.0 degree Celsius
• 0.1 degree control in STEM laboratory

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Kevin G. Hall Nanometrology Laboratory

• Vibration control below NIST A-1 standard
• EMI below 0.1 milliGauss
• Temperature control of 0.01 degree C

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Service Galleys

• Laboratories are supported by a service galley
  located behind the laboratory
• Service galley furnishes utilities to each wing
• Galleys also contain chillers, pumps, etc.
  (vibration, noise)

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Utility Distribution

• Standard Utilities
• Clean power, standard power, instrument ground
• Ultrapure water
• Process vacuum
• Bulk gases Nitrogen, Oxygen, Helium, Hydrogen
• Cooling water
• Optional Utilities (as needed)
• Higher voltages and currents
• Specialty gases Inerts, toxics, flammables,
  pyrophorics

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Ultrapure Water System

• Water specifications
• 1 part per billion Dissolved Oxygen
• lt225 parts per trillion Total Oxidizable Carbon
  (TOC)
• lt15 parts per trillion Boron
• System Volume
• 12,000 gallons per day make-up
• 100 gallons per minute recirculation
• Distribution System
• PVDF piping
• High turbulence design
• Zero-stat valves

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Typical Laboratory Wing
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Laboratory Equipment

• AFM, STM, Surface Analysis
• SEM, FIB, and TEM
• Laser Systems
• Biological and MEMS devicefabrication
• MOCVD, PECVD, MBE
• Carbon nanotube growth

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Collaborative Research with Bindley Biosciences
Center

• BNC biological laboratories located on east end
  of facility
• BindleyBiosciences Center is located just east
  of the BNC
• A walkway connects the two facilities

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Cleanroom

• 25,252 square feet
• Nanofabrication cleanroom coupled with a
  pharmaceutical grade cleanroom
• Material access between cleanrooms

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Nanofabrication Cleanroom

• Three Levels
• Full Subfab
• Cleanroom
• Air Handling
• Cleanroom
• Bay-Chase design
• Raised floor
• Bulkhead-Mounted Equipment

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The Subfab
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Bay-Chase Design

• Provides segregation of maintenance and
  operations functions
• Fewer rules physical barrier instead
• Lower cost approach
• Less first cost
• Less operating cost
• Approaches minienvironment cleanliness with less
  cost and fewer restrictions

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Raised Floor
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Nanofabrication Cleanroom

• ISO Class 3 (Class 1)
• 6 bays
• ISO Class 4 (Class 10)
• 5 bays
• ISO Class 5 (Class 100)
• 2 bays

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Capability to Upgrade Cleanliness

• Capability for adding additional airflow
• Improving cleanroom cleanliness
• Adding cleanroom floorspace (reducing chase area)
• Requires three components
• Area for additional air handlers
• Space for additional ductwork
• Modular ceiling system

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Nanofabrication Cleanroom

• Below NIST A Vibration Levels
• Temperature control
• 1.0 degree Celsius
• 0.1 degree in e-beam lithography bay
• Humidity Control
• 45 5 Relative

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Cleanroom Layout
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Cleanroom Section
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Biocleanroom

• Below NIST A Vibration Levels
• Temperature control
• 1.0 degree Celsius
• Pharmaceutical grade design

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Biocleanroom Section
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Offices, Conference Rooms, and Collaboration Areas

• 73 Offices
• 11 Conference Rooms
• Library
• Kitchenette
• Informal Gathering Areas with white boards

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• Laboratory Cleanroom Equipment

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Equipment Categories

• Atomic Force Microscopy
• Surface Analysis
• Electron Microscopy
• Analytical Systems
• Laser Systems
• Crystal Growth
• BSL-1 and BSL-2 Biological Laboratories
• Electrical Characterization

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Equipment Categories (CONTINUED)

• Lithography and Maskmaking
• Dry Etching and Cleaning
• Metal Deposition
• Other Deposition Equipment
• Thermal Processing
• Wet Etching and Cleaning
• Other Systems

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Atomic Force Microscopy

• Laboratories
• Molecular Imaging AFM
• Haptic AFM
• DI 3100 AFM (2)
• Asylum Research 3-D Atomic Force Microscope
• Veeco Atomic Force Microscope
• Bio-Scope II AFM (Bindley Bioscience Center)
• Cleanroom
• Veeco Atomic Force Microscope (AFM)

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Surface Analysis

• Omicron Multi-Technique Surface Analysis Cluster
  Tool
• High-Resolution Electron Energy Loss Spectrometer
  (EELS)
• Scanning Electron Microscope (SEM)
• Hemispherical Electron Spectrometer for XPS, AES,
  UPS, ISS
• Scanning Auger Spectrometer
• Focused Ion Beam (FIB)
• All interconnected under high vacuum
• Kratos Imaging X-Ray Photoemission Spectrometer
  (XPS)
• Omicron Ultra-High Vacuum (UHV) Scanning
  Tunneling Microscope (STM)

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Electron Microscopy

• Titan 80-300 keV Field-Emission TEM
• Environmental Transmission Electron Microscope
• Scanning Transmission Electron Microscope
• Manufactured by FEI Corporation
• H4700 Field-Emission SEM
• Manufactured by Hitachi Corporation
• NovaLab FIB/SEM
• Focused Ion Beam
• Scanning Electron Microscope
• Manufactured by FEI Corporation

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Analytical Systems

• X-Ray Diffraction System
• Near-Field Scanning Optical Microscope (NSOM)
• Near-Field Scanning Optical Microscope
• Spectrophotometer
• Fourier Transform Infrared Spectrometer
• Dynamic Light Scattering Apparatus
• Ellipsometer
• Langmuir-Blodgett Apparatus
• Mass Spectrometer

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Laser Systems

• Pulsed Laser Deposition System
• Photoluminescence System
• Laser-Based Microfluidic Analysis System
• Laser-Based Nanolithography System
• Free-Space Laser
• Interference Lithography System

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Crystal Growth and Deposition Systems

• Varian Gen-II Molecular Beam Epitaxy (MBE) System
• Aixtron AIX 200/4 Metal-Organic Chemical Vapor
  Deposition (MOCVD) System
• Epigress VP-508 Horizontal Hot-Wall CVD Reactor
• Halide Vapor-Phase Epitaxy (HVPE) System
• Plasma-Enhanced Chemical Vapor Deposition (PECVD)
  System
• Field-Emission Vacuum System

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BSL-2 Laboratories

• Micromanipulator Probe Stations (2)
• Bio-Safety-Level 2 Cabinets (2)
• Sample Glove Boxes (2)
• Fluorescence Microscopes (2)
• Laser Doppler Vibrometer
• Autoclave
• Bio-Safety-Level 2 Cabinets (2)
• Sample Freezers (2)
• Sample Refrigerators (2)
• Cell Culture Rooms (2)

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BSL-1 Laboratories

• Critical Point Dryer
• Micromanipulator Probe Station
• Optical Table
• Stereolithography
• Lab 2081
• Equipment
• Micromanipulator Probe Stations (2)
• Atomic Force Microscope
• Sample Refrigerator
• Quartz Crystal Microbalance
• Surface Plasmon Resonance

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Electrical Characterization

• Shielded Micromanipulator Probe Stations (6)
• HP 4156A Semiconductor Parameter Analyzers (2)
• HP 4284A LCR Meters
• Keithley Hi-Lo Capacitance System
• HP 4140B Picoammeter
• Tektronix 371A High-Voltage Curver Tracer
• Etc...
• Low-Temperature Probe Station

• Mercury Probe
• Hall Measurement Systems (3)
• Cascade Probe Station
• HP 8505A Network Analyzer
• HP 851B Spectrum Analyzer
• Tektronix 2755 Spectrum Analyzer
• HP 8503A S-Parameter Test Set

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Lithography

• Vistec (formerly Leica) VB-6 Ultra-High
  Resolution, Extra-Wide Field Electron Beam
  Lithography Tool, Capable of 6 nm Resolution in
  Resist
• Raith Electron Beam Lithography Tool and
  Nanotechnology Work Station
• Optical Photomask Aligner and Exposure Systems
• Canon PLA-501F
• Karl Suss MJB-3 (2)
• Karl Suss MABA-6
• Karl Suss MA-25 Double-Sided Optical Photomask
  Aligner and Exposure System
• Karl Suss SB-6E Wafer Bonding System
• Photoresist Application and Development Spinners
• Interference Lithography System

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Lithography - Maskmaking

• TRE Electromask Pattern Generator (2)
• Photoresist Application and Development Spinners
• YES Image Reversal System
• APT Automated Plate Processor

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Dry Etching and Cleaning

• Panasonic Deep Reactive Ion Etcher
• Capable of Fluorine and Chlorine etch chemistries
• STS Deep Reactive Ion Etch (RIE) Systems (2)
• Anisotropic Silicon Etcher
• Anisotropic Oxide Etcher
• Drytek Triode RIE
• PlasmaLab RIE
• XeF2 Etching System
• UV-Ozone Cleaner
• Branson Plasma Asher

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Metal Deposition

• Kurt J. Lesker electron-beam evaporator
• Airco-Temescal FDC-1800 e-beam evaporator
• Varian e-beam evaporator
• Leybold e-beam evaporator
• CHA e-beam evaporator
• Perkin-Elmer e-beam evaporator
• Veeco 7760 thermal evaporator
• Perkin-Elmer 2400 sputterer

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Deposition Systems

• AXIC PECVD System
• LPCVD Furnace System
• Low-Temperature Oxide (LTO) Deposition System
• F-120 Atomic Layer Deposition (ALD) System
• F-450 Atomic Layer Deposition (ALD) System

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Thermal Processing

• Rapid Thermal Processing
• Wet and dry oxidation
• Pyrogenic Oxidation System
• Blue-M Oxidation Furnace
• Lindberg Oxidation Furnace
• Nitric Oxide Annealer

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Wet Etching and Cleaning

• Laboratories
• Dual-purpose acid/solvent fume hoods (30)
• Must be designated acid or solvent
• Dual-function fume hood for acids and solvents
  (2)
• Cleanroom
• Acid fume hoods (4)
• Solvent fume hoods (8)
• Dual-function fume hood for acids and solvents (2)

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Other Systems

• Laboratories
• Chemical-Mechanical Polish (CMP) system
• Bonding
• Wire
• Ribbon
• Ball
• Dicing Saw

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Summary

• 22,000 square feet of laboratory space and an
  extensive equipment set provide extraordinary
  capabilities
• 25,000 square feet of cleanroom space and a wide
  variety of equipment support diverse research
  needs
• The entire set of resources provided by this
  186,000 square foot facility are designed to
  support collaborative interdisciplinary research
  in nanotechnology

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