Application of FinFET Technology to AnalogRF Circuits Matthew Muh, Professor Ali M' Niknejad - PowerPoint PPT Presentation

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Application of FinFET Technology to AnalogRF Circuits Matthew Muh, Professor Ali M' Niknejad

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Finding optimal device layouts for high-frequency performance ... Initial simulations based on BSIMSOI3.1 using preliminary SPAWAR (DC) model. ... – PowerPoint PPT presentation

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Title: Application of FinFET Technology to AnalogRF Circuits Matthew Muh, Professor Ali M' Niknejad


1
Application of FinFET Technology to Analog/RF
CircuitsMatthew Muh, Professor Ali M. Niknejad
2
Research plans
  • Evaluating the suitability of FinFET technology
    for analog/RF circuits involves the following
  • Developing a working model for SPICE simulation
    based on 3-D device simulation
  • Finding optimal device layouts for high-frequency
    performance
  • Designing, fabricating test circuits (LNA,
    oscillator) and verifying power gain, noise,
    linearity
  • Refining device models based on circuit-level
    measurements
  • Comparing utility of FinFET for different
    applications

3
RF CMOS performance trends
  • Effect of technology scaling on RF performance
  • fT improves with scaling (1/L for short-channel
    devices)
  • fMAX improves with scaling, but limited by
    strong dependence on gate resistance and
    parasitics
  • FMIN decreases with scaling for a given
    frequency
  • IIP3 Id/W must increase to maintain good
    linearity
  • Can a sub-100nm advanced transistor structure
    (FinFET) take advantage of these scaling trends
    and confer additional benefits to analog/RF
    circuits, e.g. better noise performance, improved
    gmro?

4
High-frequency modeling
  • Impact of gate resistance on RF performance
  • if ignored, potential error in impedance matching
    (e.g., to a 50-O source)
  • increased minimum noise figure
  • reduced power gain, degraded overall
    transconductance
  • fMAX
  • Gate resistance modeling
  • Rgate consists of two components
  • distributed gate electrode resistance
  • channel-induced gate resistance
  • Minimize gate resistance by using
  • gate contacts on both ends
  • proper layout (short multi-gate finger
    structures)
  • silicided poly-gate/metal gate technologies

Source Jin, IEDM98
5
FinFET structure and layout
  • The double-gate FinFETa promising candidate to
    continue CMOS scaling deep into the nanometer
    regime
  • Gate straddles thin silicon fin, forming two
    conducting channels on sidewall

3D view of FinFET
  • Layout similar to conventional SOI MOSFET

Source (all images) T-J King, et al, FinFET
Technology Optimization presentation slides,
Oct. 2003
6
FinFET modeling
  • Need a suitable SPICE model for initial design
    based on transistor I-V, C-V, and AC
    (S-parameter) characteristics
  • Initial simulations based on BSIMSOI3.1 using
    preliminary SPAWAR (DC) model. BSIM DG currently
    under development.
  • Need to verify high-frequency behavior of SPICE
    model
  • BSIMSOI3.1 includes RF functionality and has been
    incorporated into spice3
  • How to obtain RF model parameters?

7
Future work
  • Run 3-D device simulations using ISE DESSIS to
    extract high-frequency Y-parameters
  • Can we obtain measured S-parameter data?
  • Consider how best to build an adequate SPICE
    model (AC) based on device simulation results
  • With a working SPICE model, estimate important
    high-frequency figures of merit and begin to
    design basic analog/RF circuits for system-level
    verification of power gain, noise, linearity
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