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Surface Study of In2O3 and Sndoped In2O3 thin films with 100 and 111 orientations

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In2O3 Crystal Structure. BCC a = 1.0117 nm. Substrate lattice mismatch is 1 ... by A. Klein et al. Phys. Rev. B 73 245312 (2006) 2.8. 2.7 (111) 2.6. 2.6 (100) ITO (eV) ... – PowerPoint PPT presentation

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Title: Surface Study of In2O3 and Sndoped In2O3 thin films with 100 and 111 orientations


1
Surface Study of In2O3 and Sn-doped In2O3 thin
films with (100) and (111) orientations
  • Erie H. Moralesa), M. Batzillb) and U. Diebolda)
  • a) Department of Physics, Tulane University, New
    Orleans, LA 70118
  • b) Department of Physics, University of South
    Florida, Tampa, FL 33620

NSF CHE 0715576, CHE 010908
2
Motivation
  • Sn doped In2O3 is a Transparent Conducting Oxide
  • Besides being used in solar cells finds
    application in Organic Light Emitting Diodes as
    hole injector
  • Mostly used in polycristalline form
  • Orientation most studied is (100)
  • Few surfaces studies on any other low index
    orientation

3
Characterization
  • Substrates and films where characterized using in
    situ RHEED, LEED and XPS
  • Also sample where characterized using UPS at
    Center for Advanced Microstructures and Devices,
    Baton Rouge Louisiana

4
Preparation
  • Substrate
  • YSZ Yttrium Stabilized Zirconia, (Y 9)
  • Cubic body centered, cube-on-cube epitaxy with
    In2O3
  • Lattice parameter
  • YSZ is 0.5125 nm
  • In2O3 is 1.0117 nm
  • Substrate prepared by high temp treatment at 1350
    C

Hiromichi Ohta et al. Appl. Phys. Lett. 76 19
(2000) 2740-2742
5
RHEED Substrate Characterization
6
In2O3 Crystal Structure
  • BCC a 1.0117 nm
  • Substrate lattice mismatch is 1
  • (100) has a polar character
  • (111) is not polar

7
In2O3 Films
  • Films
  • UHV 5 10-10 mbar base pressure
  • Molecular Beam Epitaxy
  • In e-beam evaporated at 0.1 nm/min
  • Oxygen Plasma Assisted at 15mA
  • O2 at 5 10-6mbar
  • O2 at 10-5 mbar
  • Sn was co-evaporated using a Knudsen cell
  • Growth temperatures at 450, 550 and 800C, highest
    temp gives best results

8
RHEED In2O3 Film
9
LEEDIn2O3 ITO (100)
  • In2O3 (100) facets
  • Sn doped In2O3 at different Sn concentrations
    from 11 to 3 results in stabilization of the
    surface
  • 9 Sn shown

10
ARXPS
  • Surface sensitive at higher polar angles. When
    rotating sample photoelectron would need to
    travel longer distance to surface. Considering
    IMFP only photoelectrons closer to surface manage
    to be detected

11
ARXPS of In2O3 (100) and Forward Scattering
Analysis
12
Sn-doped In2O2 (100)
  • Sn segregates to the surface

13
Sn-doped In2O2 (111)
  • Sn does not segregate to surface, I measured this
    yesterday!!!, nice!

14
LEED
  • YSZ(111) substrate and In2O3 at 103eV

YSZ(111)
In2O3 (111)
2x2
15
UPS
  • Point is Sn derived states in the Band Gap
  • Point is to correlate it to Sn segregation
    observed in XPS and the fact that UPS is surface
    sensitive corroborating Sn migration to the
    surface or Sn terminated surface

16
Valence Band Maximum
  • Still an open question the measured VBM at 2.6 eV
    smaller than 3.7eV
  • Optical BG Direct and Indirect meas. by Weiher
    and Ley J. Appl. Phys 37 1 (1966)
  • UPS meas. by A. Klein et al. Phys. Rev. B 73
    245312 (2006)

17
In2O3 ITO (100)
  • Gap State and Resonant Photoemission of gap state

18
Compare VB ITO (100) (111)
  • Point is Sn derived states doesnt show so
    clearly

19
Conclusions Outlook
  • Sn stabilizes the (100) surface so it doesnt
    facet
  • Sn replaces substitutionally In sites
  • There are clear Sn derived states in Band Gap
  • The position of the VBM is an open question
  • Less clear Sn derived states in (111)
    corroborated by UPS and ARXPS
  • Do absorption experiments to see if Sn derived
    states move to the conduction band on (111)
    orientation
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