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Rapid Extraction Methods for the Process Laboratory

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Improvements In Column Extraction. 1990s: Need to upgrade radiochemistry methods at SRS ... U by laser phosphorescence. Pu and U actinide isotopics TIMS ... – PowerPoint PPT presentation

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Title: Rapid Extraction Methods for the Process Laboratory


1
Rapid Extraction Methods for the Process
Laboratory
  • S. L. Maxwell, III
  • V. D. Jones
  • S. T. Nichols
  • J. Satkowski
  • M. A. Bernard
  • Westinghouse Savannah River Site

2
Improvements In Column Extraction
  • 1990s Need to upgrade radiochemistry methods at
    SRS
  • Methods developed and implemented
  • Rapid Column Extraction Applications at SRS
  • Pu, Np, U, Am, Th, Sr, Tc-99 for waste and
    process solutions at SRS (tandem methods)
  • E. Philip Horwitz, S.L. Maxwell et al., Analytica
    Chimica Acta, 310, 63, (1995).
  • TEVA UTEVA TRU sequential methods
  • Applied primarily to waste tank samples

3
Improvements In Column Extraction
  • Upgraded process laboratory methods in 1996
  • Pu and Np by alpha spectrometry
  • U by laser phosphorescence
  • Pu and U actinide isotopicsTIMS
  • S.L. Maxwell III, Rapid Actinide-Separation
    Methods, Radioactivity and Radiochemistry, 8, No
    4, 36, (1997)
  • Pu-TEVA (valence-ferrous sulfate/sodium nitrite)
  • Np-TEVA (valence-ferrous sulfamate ascorbic
    acid)
  • U on UTEVA (valence-ferrous sulfamate)
  • Dual column TEVA UTEVA cartridge
    (valence-ferrous sulfate/sodium nitrite)

4
Improvements In Column Extraction
  • Expanded to characterization of metals/oxides
  • UTEVA method for Pu/U oxides (Impurity assay in
    mixed oxide or actinide process
    solutions1998-1999)
  • Trace actinides in mixed oxide materials (Np, Th,
    Am extraction for ICP-MS using TEVA,
    UTEVA1998-1999)
  • New UTEVA method for Pu and U-Isotope Dilution
    Mass spectrometry in mixed oxides (strip Pu
    separately using 3M HNO3-0.2MHF) -(2000)

5
UTEVA Pu/U Separation for IDMS Assay by TIMS
  • Currently Pu isotopics on TEVA U on UTEVA
  • For mixed U/Pu solutions requiring
    assay/isotopics, combine on UTEVA
  • Approach
  • Load on UTEVA
  • Strip Pu first using 3M HNO3-0.2M HF, then strip
    U with 0.02M HNO3-0.005M HF.
  • Reduces labor costs and improves productivity

6
UTEVA Pu/U Separation for IDMS Assay by TIMS
  • 1 mL UTEVA resin
  • U-233 (140 ug) and Pu-244 (0.7 ug) spiked samples
  • Load solution 5 mL 2.5 M HNO3-0.5M Al (NO3) 3
  • Valence adjustment to Pu (IV) with ferrous
    sulfate/nitrite
  • Column rinse 13 mL 3M HNO3
  • Pu strip 5 mls 3M HNO3 -0.2M HF (ash well to
    remove F)
  • U strip 5 mL 0.02M HNO3 -0.005M HF

7
Np, Th in Mixed Oxide by ICP-MS
  • Material dissolution by microwave
  • Dilution in glove box separation in radiohood
  • Np and Th on 1 mL TEVA resin
  • Load solution 2.5M HNO3-0.5M Al(NO3) 3
  • Reduce Pu to Pu3 ferrous sulfamate ascorbic
    acid
  • 3M HNO3 rinse
  • Pu 3 / U 6 not retained on TEVA
  • Strip NpTh together using 5 mL 0.02M HNO3-0.005M
    HF
  • Use 2nd TEVA column to remove nearly all UPu
  • Dilute and analyze by ICP-MS
  • 95 recovery

8
UTEVA Pu/U Removal for Metals Assay
  • Background
  • AG MP-1 Anion resin for Pu removal prior to
    ICP-AES/MS of impurities in metal/oxides to
    removal spectral interference
  • Problem at least partial retention of Au, Ag,
    Pt, Ir, Pd, Nb, Tl, La, Ce and Ta on anion resin
  • Increased need to analyze mixed Pu/U materials
    requiring Pu/U removal
  • UTEVA resin offers improved impurity recovery and
    removes both Pu and U

9
UTEVA Pu/U Removal Method
  • UTEVA resin (diamylamylphosphonate)
  • Recovers all impurities except Au
  • Zr, Ta, Hf, Nb require dilute HF in column load
    (and/or rinse) solution
  • Handles Pu, U or Pu/U mixtures
  • Large 10 mL columns remove 200 mg or more of Pu/U
  • Au done by dilute HCL-HF cation method

10
UTEVA Pu/U Removal Method for Impurities Assay
  • Glove box separation for Pu materials
  • Load solution 10 mL 8 M HNO3-0.04M HF
  • Column rinse 14-19 mLs 8M HNO3 (optional with
    HF)
  • Adjust to 25 or 30 mL in graduated tube
  • Pu/U recovery from resin 20 mL 0.1M HCl-0.05M HF
  • Note
  • No HF in rinse to enhance Pu retention still
    adequate recovery of Zr, Ta, Hf, Nb
  • May increase HF with U only to increase Ta, etc.,
    but minimize to minimize Si background at
    ICP-torch due to HF
  • Load solution can be larger
  • HF in rinse may be necessary if HF is less in
    load solution

11
Average Column Spike RecoveriesICP-AES
Element Recovery Element Recovery Element
Recovery
  • Ag 92 Hf 84 Se 101
  • Al 99 Hg 69 Si 151
  • As 90 K 87 Ta 69
  • B 100 La 100 V 98
  • Ba 100 Li 97 W 106
  • Be 98 Mg 105 Zn 101
  • Ca 94 Mo 98 Zr 63
  • Cd 96 Na 105
  • Ce 103 Nb 99
  • Cr 102 Ni 101
  • Cu 98 P 161
  • Fe 106 Pb 84
  • Ga 104 S 97

12
Average Column Spike RecoveriesICP-MS
Element Recovery Element Recovery Element
Recovery
  • Ag 106 Hf 90 Se 87
  • Al 101 Hg 77 Si 132
  • As 88 K 102 Ta 84
  • B 89 La 108 V 104
  • Ba 106 Li 101 W 113
  • Be 90 Mg 103 Zn 91
  • Ca NA Mo 101 Zr 63
  • Cd 94 Na 98
  • Ce 108 Nb 98
  • Cr 103 Ni 103
  • Cu 106 P 154
  • Fe 106 Pb 99
  • Ga 101 S NA

13
Analysis of CRM-124 Uranium Oxide Standards
Measured Ref. Prepared Value/ Element (ppm)
dc arc range (ppm) Difference
  • Al 102 105 (81-120) -3
  • Be 11.6 12.5 (10-17) -7
  • Cr 55.4 52 (50-64) 6
  • Mg 52.4 51 (37-86) 3
  • Mo 53.7 50 (30-50) 7
  • Na 230 200 (189-252) 15
  • Ni 106 102 (92-158) 4
  • V 24.2 25 (23-30) -3
  • W 105 100 (86-95) 5
  • Zn 110 102 (75-115) 8
  • Zr 108 100 (67-100) 8
  • measured single solution analyzed once by
    ICP-AES and ICP-MS

14
Am in Mixed Oxide by ICP-MS
  • Use solution (8M HNO3) from initial UTEVA resin
    separation (10 ml resin) for metal impurities
  • No retention of Am on UTEVA resin
  • Remove traces of uranium and plutonium using 2 ml
    UTEVA column
  • 2 mL aliquot
  • 8 mL 8M HNO3 column rinse
  • Dilute to low acid
  • Analyze by ICP-MS

15
Summary
  • Process column methods
  • Faster and more rugged
  • Reduced labor costs
  • Better accuracy and precision
  • Reduced rework
  • No mixed waste solvents
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