Title: Rapid Extraction Methods for the Process Laboratory
1Rapid Extraction Methods for the Process
Laboratory
- S. L. Maxwell, III
- V. D. Jones
- S. T. Nichols
- J. Satkowski
- M. A. Bernard
- Westinghouse Savannah River Site
2Improvements In Column Extraction
- 1990s Need to upgrade radiochemistry methods at
SRS - Methods developed and implemented
- Rapid Column Extraction Applications at SRS
- Pu, Np, U, Am, Th, Sr, Tc-99 for waste and
process solutions at SRS (tandem methods) - E. Philip Horwitz, S.L. Maxwell et al., Analytica
Chimica Acta, 310, 63, (1995). - TEVA UTEVA TRU sequential methods
- Applied primarily to waste tank samples
3Improvements In Column Extraction
- Upgraded process laboratory methods in 1996
- Pu and Np by alpha spectrometry
- U by laser phosphorescence
- Pu and U actinide isotopicsTIMS
- S.L. Maxwell III, Rapid Actinide-Separation
Methods, Radioactivity and Radiochemistry, 8, No
4, 36, (1997) - Pu-TEVA (valence-ferrous sulfate/sodium nitrite)
- Np-TEVA (valence-ferrous sulfamate ascorbic
acid) - U on UTEVA (valence-ferrous sulfamate)
- Dual column TEVA UTEVA cartridge
(valence-ferrous sulfate/sodium nitrite)
4Improvements In Column Extraction
- Expanded to characterization of metals/oxides
- UTEVA method for Pu/U oxides (Impurity assay in
mixed oxide or actinide process
solutions1998-1999) - Trace actinides in mixed oxide materials (Np, Th,
Am extraction for ICP-MS using TEVA,
UTEVA1998-1999) - New UTEVA method for Pu and U-Isotope Dilution
Mass spectrometry in mixed oxides (strip Pu
separately using 3M HNO3-0.2MHF) -(2000)
5UTEVA Pu/U Separation for IDMS Assay by TIMS
- Currently Pu isotopics on TEVA U on UTEVA
- For mixed U/Pu solutions requiring
assay/isotopics, combine on UTEVA - Approach
- Load on UTEVA
- Strip Pu first using 3M HNO3-0.2M HF, then strip
U with 0.02M HNO3-0.005M HF. - Reduces labor costs and improves productivity
6UTEVA Pu/U Separation for IDMS Assay by TIMS
- 1 mL UTEVA resin
- U-233 (140 ug) and Pu-244 (0.7 ug) spiked samples
- Load solution 5 mL 2.5 M HNO3-0.5M Al (NO3) 3
- Valence adjustment to Pu (IV) with ferrous
sulfate/nitrite - Column rinse 13 mL 3M HNO3
- Pu strip 5 mls 3M HNO3 -0.2M HF (ash well to
remove F) - U strip 5 mL 0.02M HNO3 -0.005M HF
7Np, Th in Mixed Oxide by ICP-MS
- Material dissolution by microwave
- Dilution in glove box separation in radiohood
- Np and Th on 1 mL TEVA resin
- Load solution 2.5M HNO3-0.5M Al(NO3) 3
- Reduce Pu to Pu3 ferrous sulfamate ascorbic
acid - 3M HNO3 rinse
- Pu 3 / U 6 not retained on TEVA
- Strip NpTh together using 5 mL 0.02M HNO3-0.005M
HF - Use 2nd TEVA column to remove nearly all UPu
- Dilute and analyze by ICP-MS
- 95 recovery
8UTEVA Pu/U Removal for Metals Assay
- Background
- AG MP-1 Anion resin for Pu removal prior to
ICP-AES/MS of impurities in metal/oxides to
removal spectral interference - Problem at least partial retention of Au, Ag,
Pt, Ir, Pd, Nb, Tl, La, Ce and Ta on anion resin - Increased need to analyze mixed Pu/U materials
requiring Pu/U removal - UTEVA resin offers improved impurity recovery and
removes both Pu and U
9UTEVA Pu/U Removal Method
- UTEVA resin (diamylamylphosphonate)
- Recovers all impurities except Au
- Zr, Ta, Hf, Nb require dilute HF in column load
(and/or rinse) solution - Handles Pu, U or Pu/U mixtures
- Large 10 mL columns remove 200 mg or more of Pu/U
- Au done by dilute HCL-HF cation method
10UTEVA Pu/U Removal Method for Impurities Assay
- Glove box separation for Pu materials
- Load solution 10 mL 8 M HNO3-0.04M HF
- Column rinse 14-19 mLs 8M HNO3 (optional with
HF) - Adjust to 25 or 30 mL in graduated tube
- Pu/U recovery from resin 20 mL 0.1M HCl-0.05M HF
- Note
- No HF in rinse to enhance Pu retention still
adequate recovery of Zr, Ta, Hf, Nb - May increase HF with U only to increase Ta, etc.,
but minimize to minimize Si background at
ICP-torch due to HF - Load solution can be larger
- HF in rinse may be necessary if HF is less in
load solution
11Average Column Spike RecoveriesICP-AES
Element Recovery Element Recovery Element
Recovery
- Ag 92 Hf 84 Se 101
- Al 99 Hg 69 Si 151
- As 90 K 87 Ta 69
- B 100 La 100 V 98
- Ba 100 Li 97 W 106
- Be 98 Mg 105 Zn 101
- Ca 94 Mo 98 Zr 63
- Cd 96 Na 105
- Ce 103 Nb 99
- Cr 102 Ni 101
- Cu 98 P 161
- Fe 106 Pb 84
- Ga 104 S 97
12Average Column Spike RecoveriesICP-MS
Element Recovery Element Recovery Element
Recovery
- Ag 106 Hf 90 Se 87
- Al 101 Hg 77 Si 132
- As 88 K 102 Ta 84
- B 89 La 108 V 104
- Ba 106 Li 101 W 113
- Be 90 Mg 103 Zn 91
- Ca NA Mo 101 Zr 63
- Cd 94 Na 98
- Ce 108 Nb 98
- Cr 103 Ni 103
- Cu 106 P 154
- Fe 106 Pb 99
- Ga 101 S NA
13Analysis of CRM-124 Uranium Oxide Standards
Measured Ref. Prepared Value/ Element (ppm)
dc arc range (ppm) Difference
- Al 102 105 (81-120) -3
- Be 11.6 12.5 (10-17) -7
- Cr 55.4 52 (50-64) 6
- Mg 52.4 51 (37-86) 3
- Mo 53.7 50 (30-50) 7
- Na 230 200 (189-252) 15
- Ni 106 102 (92-158) 4
- V 24.2 25 (23-30) -3
- W 105 100 (86-95) 5
- Zn 110 102 (75-115) 8
- Zr 108 100 (67-100) 8
- measured single solution analyzed once by
ICP-AES and ICP-MS
14Am in Mixed Oxide by ICP-MS
- Use solution (8M HNO3) from initial UTEVA resin
separation (10 ml resin) for metal impurities - No retention of Am on UTEVA resin
- Remove traces of uranium and plutonium using 2 ml
UTEVA column - 2 mL aliquot
- 8 mL 8M HNO3 column rinse
- Dilute to low acid
- Analyze by ICP-MS
15Summary
- Process column methods
- Faster and more rugged
- Reduced labor costs
- Better accuracy and precision
- Reduced rework
- No mixed waste solvents